Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.54 |
| ▸ | GAA | P10253 | 4/20 | 0.54 |
| ▸ | MEN1 | O00255 | 3/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.54 |
| ▸ | MAPT | P10636 | 3/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.54 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.50 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.50 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.50 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.50 |
| ▸ | NPC1 | O15118 | 5/20 | 0.49 |
| ▸ | RAB9A | P51151 | 5/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 2/20 | 0.43 |
| ▸ | CASP6 | P55212 | 1/20 | 0.43 |
| ▸ | BTK | Q06187 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30473469 | 1.00 | KMT2A (0.54) | KMT2AGAAMEN1KDM4EMAPT | |
| SCHEMBL30369173 | 0.85 | RAB9A (0.61) | KMT2AGAAMEN1KDM4EMAPT | |
| SCHEMBL194202 | 0.85 | RAB9A (0.61) | KMT2AGAAMEN1KDM4EMAPT | |
| SCHEMBL3925314 | 0.83 | ALDH1A1 (0.60) | KMT2AGAAMEN1KDM4EMAPT | |
| SCHEMBL10040388 | 0.82 | MEN1 (0.48) | KMT2AGAAMEN1KDM4EMAPT | |
| SCHEMBL17084523 | 0.82 | RAB9A (0.57) | KMT2AGAAMEN1KDM4ENPC1 | |
| SCHEMBL10040397 | 0.82 | TRPV1 (0.59) | KMT2AMEN1KDM4EMAPTRAB9A | |
| SCHEMBL13588247 | 0.82 | TRPV1 (0.50) | KMT2AGAAMEN1KDM4EMAPT | |
| SCHEMBL13588245 | 0.82 | CYP1A2 (0.49) | KMT2AGAAMEN1KDM4EMAPT | |
| SCHEMBL11737076 | 0.81 | TDP1 (0.51) | KMT2AGAAMEN1KDM4EMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2404940-B1 | Method for producing polymer composition and polymer composition | INCTEC INC (JP) | 2014-12-24 | — | — | EP | claimed |
| US-7960470-B2 | Method for producing polymer composition and polymer composition | THE INCTEC INC. (JP) | 2011-06-14 | — | — | US | claimed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4679175-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250361419-A1 | COMPOSITION FOR FORMING COATING FILM FOR REMOVING FOREIGN MATTERS AND SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250355357-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20250348001-A1 | METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| WO-2025121364-A1 | METHOD FOR MANUFACTURING LAMINATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT | 日産化学株式会社 | 2025-06-12 | — | — | WO | disclosed |
| EP-1911770-A1 | METHOD FOR PRODUCING POLYMER COMPOSITION AND POLYMER COMPOSITION | The Inctec Inc. (JP) | 2008-04-16 | — | — | EP | disclosed |
| CN-101040220-A | Sulfur-atom-containing composition for forming of lithographic antireflection film | NISSAN CHEMICAL IND LTD (JP) | 2007-09-19 | — | — | CN | disclosed |
| EP-1785440-A1 | CURABLE RESIN COMPOSITION, SHAPED ARTICLE AND METHOD FOR PRODUCING SAME | Showa Highpolymer Co., Ltd. (JP) | 2007-05-16 | — | — | EP | disclosed |
| CN-1902550-A | Composition for forming nitride coating film for hard mask | NISSAN CHEMICAL IND LTD (JP) | 2007-01-24 | — | — | CN | disclosed |
| EP-0916683-B1 | LIGHT-ABSORBING POLYMER, COMPOSITION FORMING LIGHT-ABSORBING COATINGS, LIGHT-ABSORBING COATINGS, AND ANTIREFLECTION COATING MADE BY USING THE SAME | CLARIANT FINANCE BVI LTD (VG) | 2004-12-15 | — | — | EP | disclosed |
| US-6737492-B2 | COMPRISES CHROMOPHORE AND ANTIREFLECTIVE COATING FOR USE IN MANUFACTURING INTEGRATED CIRCUITS BY LITHOGRAPHY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-05-18 | — | — | US | disclosed |
| US-20030065119-A1 | Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating | CLARIANT FINANCE (BVI) LIMITED | 2003-04-03 | — | — | US | disclosed |
| US-6468718-B1 | COPOLYMER OF AN ACRYLIC KETONE MOMONER AND AN ACRYLIC MONOMER HAVING THE CHROMOPHORE | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-10-22 | — | — | US | disclosed |
| EP-0916683-A1 | LIGHT-ABSORBING POLYMER, COMPOSITION FORMING LIGHT-ABSORBING COATINGS, LIGHT-ABSORBING COATINGS, AND ANTIREFLECTION COATING MADE BY USING THE SAME | CLARIANT INTERNATIONAL LTD. (CH) | 1999-05-19 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | KMT2A 1145/4885GAA 2275/4885MEN1 1625/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.