⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14519228 | 0.81 | TSHR (0.33) | — | |
| SCHEMBL685522 | 0.81 | — | — | |
| SCHEMBL14519253 | 0.80 | TSHR (0.33) | — | |
| SCHEMBL14543780 | 0.77 | TSHR (0.31) | — | |
| SCHEMBL39900 | 0.76 | CYP17A1 (0.40) | — | |
| SCHEMBL14519239 | 0.76 | HSD11B1 (0.35) | — | |
| SCHEMBL14543778 | 0.76 | TSHR (0.33) | — | |
| SCHEMBL3305006 | 0.75 | ALDH1A1 (0.34) | — | |
| SCHEMBL14519225 | 0.73 | HSD11B1 (0.33) | — | |
| SCHEMBL10171490 | 0.73 | PKM (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7816471-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-10-19 | — | — | US | disclosed |
| US-20100099836-A1 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS | WATANABE HITOSHI | 2010-04-22 | — | — | US | disclosed |
| US-7662897-B2 | dropping polymerization of monomers such as 1-hydroxy-3-methacryloyloxyadamantane (HMA), 5-methacryloyloxy-2,6-norbornane carbolactone (MNBL), 2-methacryloyloxy-2-methyladamantane (2-MMA), solvent extraction, redissolving, desolventing; purification; metal-free | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-02-16 | — | — | US | disclosed |
| US-7655743-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-02-02 | — | — | US | disclosed |
| US-20080268377-A1 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS | WATANABE HITOSHI | 2008-10-30 | — | — | US | disclosed |
| EP-1491560-B1 | PROCESS FOR THE PRODUCTION OF HIGH-MOLECULAR COMPOUNDS FOR PHOTORESIST | DAICEL CHEM (JP) | 2007-11-21 | — | — | EP | disclosed |
| US-7205090-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-17 | — | — | US | disclosed |
| US-7205090-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-17 | — | — | US | disclosed |
| US-20060116494-A1 | Process for producing photoresist polymeric compounds | WATANABE HITOSHI | 2006-06-01 | — | — | US | disclosed |
| US-20060116493-A1 | Process for producing photoresist polymeric compounds | WATANABE HITOSHI | 2006-06-01 | — | — | US | disclosed |
| US-7015291-B2 | Process for the production of high-molecular compounds for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-21 | — | — | US | disclosed |
| US-20050100815-A1 | Process for the production of high-molecular compounds for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-05-12 | — | — | US | disclosed |