Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.50 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11573333 | 0.81 | ALDH1A1 (0.44) | ALDH1A1TSHRMAPK1SMN1; SMN2 | |
| SCHEMBL7637416 | 0.79 | ALDH1A1 (0.42) | ALDH1A1TSHRMAPK1 | |
| SCHEMBL19057016 | 0.77 | ALDH1A1 (0.46) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL13009131 | 0.76 | ALDH1A1 (0.49) | ALDH1A1TSHRMAPK1SMN1; SMN2 | |
| SCHEMBL10472991 | 0.76 | ALDH1A1 (0.52) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL28545792 | 0.75 | ALDH1A1 (0.45) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL17493417 | 0.75 | ALDH1A1 (0.45) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL17011976 | 0.74 | ALDH1A1 (0.50) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL36444 | 0.74 | ALDH1A1 (0.50) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 | |
| SCHEMBL22592522 | 0.74 | ALDH1A1 (0.50) | ALDH1A1TSHRMAPK1SMN1; SMN2TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150291733-A1 | METHOD FOR THE PRODUCTION OF A HIGH-MOLECULAR POLYESTER OR COPOLYESTER AND ALSO OF A POLYMER BLEND COMPRISING THESE | UHDE INVENTA-FISCHER GMBH (DE) | 2015-10-15 | — | — | US | disclosed |
| CN-101773129-B | Compound insecticidal main agent of destruxins and matrine and compound insecticide | UNIV SOUTH CHINA AGRICULT | 2013-04-24 | — | — | CN | disclosed |
| CN-102450272-A | Insecticidal composition containing thiacloprid amide and buprofezin | HAILIR PESTICIDES & CHEM GROUP | 2012-05-16 | — | — | CN | disclosed |
| CN-102450276-A | Insecticidal composition containing thiamethoxam amide and thiamethoxam | HAILIR PESTICIDES & CHEM GROUP | 2012-05-16 | — | — | CN | disclosed |
| CN-102450271-A | Insecticidal composition containing thiacloprid amide and pymetrozine | HAILIR PESTICIDES & CHEM GROUP | 2012-05-16 | — | — | CN | disclosed |
| CN-101773129-A | Compound insecticidal main agent of destruxins and matrine and compound insecticide | UNIV SOUTH CHINA AGRICULT | 2010-07-14 | — | — | CN | disclosed |
| US-7709548-B2 | Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product | SAN-APRO LIMITED (JP) | 2010-05-04 | — | — | US | disclosed |
| CN-100586282-C | Insecticidal composition containing chlorantraniliprole and monosultap | CHINA PESTICIDE DISCOVERY ENGINEERING TECHNICAL RES CT | 2010-02-03 | — | — | CN | disclosed |
| US-20090047436-A1 | AQUEOUS COATING COMPOSITION, ORGANIC-INORGANIC COMPOSITE COATING FILM AND PRODUCTION METHOD THEREOF | DIC CORPORATION (JP) | 2009-02-19 | — | — | US | disclosed |
| US-20080249270-A1 | Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product | DATE MASASHI | 2008-10-09 | — | — | US | disclosed |
| CN-101268779-A | Insecticidal composition containing chlorantraniliprole and monosultap | CHINA PESTICIDE DISCOVERY ENGI (CN) | 2008-09-24 | — | — | CN | disclosed |
| EP-1961790-A1 | AQUEOUS COATING COMPOSITION, ORGANIC/INORGANIC COMPOSITE COATING FILM AND METHOD FOR PRODUCING SAME | DIC Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |
| US-20080108720-A1 | Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product | DATE MASASHI | 2008-05-08 | — | — | US | disclosed |
| EP-1640363-B1 | PROCESS FOR PRODUCTION OF MONOSULFONIUM SALTS, CATIONIC POLYMERIZATION INITIATORS, CURABLE COMPOSITIONS, AND PRODUCTS OF CURING | SAN APRO LTD (JP) | 2008-01-16 | — | — | EP | disclosed |
| US-20060247401-A1 | Process for production of monosulfonium salts, cationic polymerization initiators, curable compositions, and products of curing | SAN-APRO LIMITED (JP) | 2006-11-02 | — | — | US | disclosed |
| EP-1640363-A1 | PROCESS FOR PRODUCTION OF MONOSULFONIUM SALTS, CATIONIC POLYMERIZATION INITIATORS, CURABLE COMPOSITIONS, AND PRODUCTS OF CURING | San-Apro Limited (JP) | 2006-03-29 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060247401-A1 | Process for production of monosulfonium salts, cationic polymerization initiators, curable compositions, and products of curing | RPS6, SPIN4, SRM | ALDH1A1 2558/4885TSHR 3341/4885MAPK1 2761/4885 |
| US-20080108720-A1 | Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product | SPIN4, RPS6, SRM | ALDH1A1 2815/4885TSHR 3545/4885MAPK1 2896/4885 |
| US-20080249270-A1 | Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product | SPIN4, RPS6, SRM | ALDH1A1 2815/4885TSHR 3545/4885MAPK1 2896/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.