SCHEMBL3311523

SCHEMBL3311523

CC(=CC(C)OS)C(=O)O

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
APEX1 P27695 1/20 0.31
PTGS1 P23219 1/20 0.30
AKR1C3 P42330 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13685332 0.79 APEX1 (0.35) APEX1PTGS1AKR1C3
SCHEMBL536916 0.79 APEX1 (0.35) APEX1PTGS1AKR1C3
SCHEMBL8150337 0.77 TSHR (0.44) APEX1PTGS1AKR1C3
SCHEMBL13685385 0.77 TSHR (0.33) APEX1PTGS1AKR1C3
SCHEMBL642406 0.77 TSHR (0.33) APEX1PTGS1AKR1C3
SCHEMBL2865295 0.76 APEX1 (0.30) APEX1
SCHEMBL28033659 0.76 PTGS1 (0.33) APEX1PTGS1
SCHEMBL8726425 0.75 PTGS1 (0.37) APEX1PTGS1AKR1C3
SCHEMBL8726421 0.75 PTGS1 (0.37) APEX1PTGS1AKR1C3
SCHEMBL4343046 0.74 LMNA (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8497062-B2 Resin for formation of upper antireflective film, composition for formation of upper antireflective film, and resist pattern formation method JSR CORPORATION (JP) 2013-07-30 US disclosed
US-20100112475-A1 RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, AND RESIST PATTERN FORMATION METHOD JSR CORPORATION (JP) 2010-05-06 US disclosed