SCHEMBL642406

SCHEMBL642406

CC(=CC(C)OC(C)C)C(=O)O

nearest known ligand 0.33

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.33
HCAR2 Q8TDS4 1/20 0.31
APEX1 P27695 1/20 0.31
GRIK1 P39086 2/20 0.31
GRIA2 P42262 2/20 0.31
GRIA4 P48058 2/20 0.31
GRIK3 Q13003 2/20 0.31
GRIK5 Q16478 2/20 0.31
GRIA1 P42261 1/20 0.31
GRIK2 Q13002 1/20 0.31
PTGS1 P23219 1/20 0.30
AKR1C3 P42330 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13685385 1.00 TSHR (0.33) TSHRHCAR2APEX1GRIK1GRIA2
SCHEMBL28033659 0.84 PTGS1 (0.33) APEX1PTGS1
SCHEMBL475010 0.83 APEX1 (0.33) APEX1
SCHEMBL536916 0.79 APEX1 (0.35) APEX1PTGS1AKR1C3
SCHEMBL13685332 0.79 APEX1 (0.35) APEX1PTGS1AKR1C3
SCHEMBL3311523 0.77 APEX1 (0.31) APEX1PTGS1AKR1C3
SCHEMBL8150337 0.77 TSHR (0.44) TSHRHCAR2APEX1PTGS1AKR1C3
SCHEMBL16649061 0.77 LMNA (0.38)
SCHEMBL2865295 0.76 APEX1 (0.30) APEX1
SCHEMBL8726425 0.75 PTGS1 (0.37) APEX1GRIK1GRIA2GRIA4GRIK3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1776399-B1 MONODISPERSE POLYMERS CONTAINING (ALKYL)ACRYLIC ACID MOIETIES, PRECURSORS AND METHODS FOR MAKING THEM AND THEIR APPLICATIONS UNIV GENT (BE) 2012-11-14 EP claimed
US-9994685-B2 Resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-06-12 US disclosed
US-9072205-B1 Surface mounting method utilizing active resin composition SAN-EI KAGAKU CO., LTD. (JP) 2015-06-30 US disclosed
US-20150158103-A1 SURFACE MOUNTING METHOD UTILIZING ACTIVE RESIN COMPOSITION SAN-EI KAGAKU CO., LTD. (JP) 2015-06-11 US disclosed
US-20140135426-A1 RESIN COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-05-15 US disclosed
US-8710165-B2 Multibranched polymer and method for producing the same NIPPON SODA CO., LTD. (JP) 2014-04-29 US disclosed
US-8120731-B2 Color filter TOPPAN PRINTING CO., LTD. (JP) 2012-02-21 US disclosed
US-20090068396-A1 Article having color pattern formed therein TOPPAN PRINTING CO., LTD. (JP) 2009-03-12 US disclosed
US-20030154874-A1 Thermo-sensitive recording type lithographical block material, method of making up lithographical block, and lithographical block made up by the making up method NOF CORPORATION (JP) 2003-08-21 US disclosed