Known targets — ChEMBL curated mechanism
CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 2/20 | 0.49 |
| ▸ | LMNA | P02545 | 2/20 | 0.49 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.49 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.49 |
| ▸ | THPO | P40225 | 1/20 | 0.49 |
| ▸ | CA12 | O43570 | 2/20 | 0.45 |
| ▸ | CA9 | Q16790 | 2/20 | 0.45 |
| ▸ | BCHE | P06276 | 1/20 | 0.45 |
| ▸ | ACHE | P22303 | 1/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.45 |
| ▸ | ATM | Q13315 | 1/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.45 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | CNR2 | P34972 | 4/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL331272 | 0.87 | ALDH1A1 (0.57) | CYP3A4LMNACYP2D6MAPK1THPO | |
| SCHEMBL28743436 | 0.87 | L3MBTL1 (0.44) | CYP3A4LMNACYP2D6MAPK1CA12 | |
| SCHEMBL9344118 | 0.85 | LMNA (0.56) | CYP3A4LMNACYP2D6MAPK1THPO | |
| SCHEMBL11845994 | 0.84 | LMNA (0.55) | CYP3A4LMNACYP2D6MAPK1THPO | |
| SCHEMBL11723030 | 0.84 | CYP3A4 (0.50) | CYP3A4LMNACYP2D6MAPK1THPO | |
| SCHEMBL22188507 | 0.84 | KDM4E (0.45) | CA9ACHEALDH1A1KDM4ETDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL565376 | 0.82 | GPR3 (0.41) | CYP3A4LMNACYP2D6MAPK1THPO | |
| Trifluoromethanesulfonic Acid SCHEMBL565684 | 0.82 | GPR3 (0.41) | CYP3A4LMNACYP2D6MAPK1THPO | |
| SCHEMBL11574807 | 0.82 | LMNA (0.67) | CYP3A4LMNACYP2D6MAPK1THPO | |
| SCHEMBL564455 | 0.82 | ALDH1A1 (0.50) | CYP3A4LMNAMAPK1CA12CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11450445-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2022-09-20 | — | — | US | disclosed |
| US-20200303086-A1 | ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-09-24 | — | — | US | disclosed |
| US-10720259-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-07-21 | — | — | US | disclosed |
| US-20170309363-A1 | ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2017-10-26 | — | — | US | disclosed |
| EP-1323742-B1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORP (JP) | 2011-02-16 | — | — | EP | disclosed |
| EP-2012198-B1 | METHOD AND EQUIPMENT FOR PROCESSING OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDER/REPRODUCER | FUJIFILM CORP (JP) | 2010-11-24 | — | — | EP | disclosed |
| US-20100061212-A1 | METHOD AND DEVICE FOR OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDING AND REPRODUCING APPARATUS | FUJIFILM CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| EP-2012198-A1 | METHOD AND EQUIPMENT FOR PROCESSING OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDER/REPRODUCER | Fujifilm Corporation (JP) | 2009-01-07 | — | — | EP | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| US-7205085-B2 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern | JSR CORPORATION (JP) | 2007-04-17 | — | — | US | disclosed |
| US-20030171468-A1 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| EP-1331518-A2 | Radiation sensitive composition for forming an insulating film, insulating film and display device | JSR Corporation (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-20030139486-A1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| EP-0880075-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-5958648-A | Radiation sensitive resin composition | JSR CORPORATION (JP) | 1999-09-28 | — | — | US | disclosed |
| EP-0880075-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1998-11-25 | — | — | EP | disclosed |
| US-5349067-A | Method for the synthesis of quaternary ammonium salts | NIPPON PAINT CO., LTD. (JP) | 1994-09-20 | — | — | US | disclosed |