SCHEMBL3317837

SCHEMBL3317837

C=CC[Si](C)(CC=C)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR1H2 P55055 2/20 0.37
NR1H3 Q13133 2/20 0.37
MAPT P10636 1/20 0.36
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
ALDH1A1 P00352 1/20 0.33
TSHR P16473 1/20 0.33
TP53 P04637 1/20 0.33
MMP9 P14780 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
MAOB P27338 1/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C9 P11712 1/20 0.32
CYP2C19 P33261 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
PTGS1 P23219 1/20 0.31
PTGS2 P35354 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8769539 0.90 NR1H2 (0.34) NR1H2NR1H3MAPTESR1ESR2
SCHEMBL28658411 0.86 IDH1 (0.33) NR1H2NR1H3MAPTESR1ESR2
SCHEMBL15302676 0.83 NR1H2 (0.39) NR1H2NR1H3MAPTESR1ESR2
SCHEMBL9862805 0.82 NR1H2 (0.37) NR1H2NR1H3MAPTESR1ESR2
SCHEMBL1147728 0.82 NR1H2 (0.53) NR1H2NR1H3MAPTESR1ESR2
SCHEMBL21328505 0.80 NR1H2 (0.40) NR1H2NR1H3MMP9
SCHEMBL15863962 0.78 NR1H2 (0.35) NR1H2NR1H3
SCHEMBL17292829 0.78 NR1H2 (0.35) NR1H2NR1H3MAPTESR1ESR2
SCHEMBL2290391 0.78 NR1H2 (0.42) NR1H2NR1H3MAPTESR1ESR2
SCHEMBL8937181 0.78 ESR1 (0.47) NR1H2NR1H3MAPTESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119978230-A Fluorine-free silicon-containing copolymer with high heat resistance and ultralow dielectric and preparation method thereof 天津大学 2025-05-13 CN claimed
CN-113416524-A High-temperature-resistant hyperbranched poly-tertiary amine as shale inhibitor 西南石油大学 2021-09-21 CN claimed
EP-1963427-A1 FLUOROPOLYMER CURING CO-AGENT COMPOSITIONS 3M Innovative Properties Company (US) 2008-09-03 EP claimed
US-7388054-B2 Fluoropolymer curing co-agent compositions 3M INNOVATIVE PROPERTIES COMPANY (US) 2008-06-17 US claimed
WO-2007075261-A1 FLUOROPOLYMER CURING CO-AGENT COMPOSITIONS 3M INNOVATIVE PROPERTIES COMPANY (US) 2007-07-05 WO claimed
US-20070149714-A1 FLUOROPOLYMER CURING CO-AGENT COMPOSITIONS 3M INNOVATIVE PROPERTIES COMPANY 2007-06-28 US claimed
US-20260001974-A1 DISULFUR DICHLORIDE AND SILANE/SILOXANE ADDITIVE FOR MOONEY JUMP GOODYEAR TIRE & RUBBER (US) 2026-01-01 US disclosed
CN-119978230-A Fluorine-free silicon-containing copolymer with high heat resistance and ultralow dielectric and preparation method thereof 天津大学 2025-05-13 CN disclosed
US-9228107-B2 (Meth)allylsilane compound, silane coupling agent thereof, and functional material using the same KYOEISHA CHEMICAL CO., LTD. (JP) 2016-01-05 US disclosed
US-9228107-B2 (Meth)allylsilane compound, silane coupling agent thereof, and functional material using the same KYOEISHA CHEMICAL CO., LTD. (JP) 2016-01-05 US disclosed
US-20140200311-A1 (METH)ALLYLSILANE COMPOUND, SILANE COUPLING AGENT THEREOF, AND FUNCTIONAL MATERIAL USING THE SAME KYOEISHA CHEMICAL CO., LTD. (JP) 2014-07-17 US disclosed
US-8460069-B2 Lens holder HOYA CORPORATION (JP) 2013-06-11 US disclosed
US-20130115423-A1 GAS BARRIER FILM, PROCESS FOR PRODUCTION OF GAS BARRIER FILM, AND ELECTRONIC DEVICE KONICA MINOLTA HOLDINGS, INC. (JP) 2013-05-09 US disclosed
EP-0614946-B1 Curable composition KANEGAFUCHI CHEMICAL IND (JP) 1998-10-21 EP disclosed
US-5449734-A Hydrosilane, unsaturated silicone compound, platinum catalyst, siloxane KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1995-09-12 US disclosed
EP-0614946-A1 Curable composition KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1994-09-14 EP disclosed
EP-0249457-B1 METHOD FOR FORMATION OF PATTERNS MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1991-08-21 EP disclosed
US-4945028-A Method for formation of patterns using high energy beam MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1990-07-31 US disclosed
US-4715929-A Pattern forming method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1987-12-29 US disclosed
EP-0249457-A2 Method for formation of patterns MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1987-12-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20140200311-A1 (METH)ALLYLSILANE COMPOUND, SILANE COUPLING AGENT THEREOF, AND FUNCTIONAL MATERIAL USING THE SAME FGB, PFAS, MGMT NR1H2 3441/4885NR1H3 3064/4885MAPT 3601/4885
US-20260001974-A1 DISULFUR DICHLORIDE AND SILANE/SILOXANE ADDITIVE FOR MOONEY JUMP DCLRE1A, DDR1, FDFT1 NR1H2 339/4885NR1H3 308/4885MAPT 4005/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.