SCHEMBL332837

SCHEMBL332837

COc1ccccc1CC(=O)c1ccccc1OC

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 1/20 0.66
HPGD P15428 1/20 0.59
NPC1 O15118 1/20 0.58
ATM Q13315 1/20 0.56
CTSD P07339 1/20 0.54
L3MBTL1 Q9Y468 2/20 0.54
KMT2A Q03164 2/20 0.53
ALDH1A1 P00352 1/20 0.53
HTT P42858 1/20 0.53
HIF1A Q16665 1/20 0.52
CNR2 P34972 1/20 0.52
LMNA P02545 1/20 0.51
SMN1; SMN2 Q16637 1/20 0.51
MAPT P10636 1/20 0.51
IDO1 P14902 1/20 0.51
TDO2 P48775 1/20 0.51
CTNNB1 P35222 1/20 0.51
WNT3A P56704 1/20 0.51
HDAC8 Q9BY41 1/20 0.51
HDAC1 Q13547 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL758911 0.88 TTR (0.61) TTRHPGDNPC1ATMCTSD
SCHEMBL1246697 0.84 RAB9A (0.65) TTRHPGDNPC1L3MBTL1KMT2A
SCHEMBL16324582 0.84 TTR (0.60) TTRHPGDNPC1L3MBTL1KMT2A
SCHEMBL2336465 0.83 NPC1 (0.59) HPGDNPC1CTSDL3MBTL1KMT2A
SCHEMBL236891 0.82 TTR (0.70) TTRNPC1ATML3MBTL1KMT2A
SCHEMBL29861033 0.82 NPC1 (0.63) HPGDNPC1CTSDL3MBTL1KMT2A
SCHEMBL597834 0.82 L3MBTL1 (0.69) TTRNPC1L3MBTL1KMT2AHTT
SCHEMBL3282912 0.82 NPC1 (0.63) HPGDNPC1CTSDL3MBTL1KMT2A
SCHEMBL10872763 0.82 TTR (0.48) TTRHPGDNPC1CTSDL3MBTL1
SCHEMBL21128714 0.81 NPC1 (0.83) HPGDNPC1CTSDL3MBTL1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109415631-B Liquid crystal composition, mixture, polymer/liquid crystal composite material, optical element and use thereof 捷恩智株式会社 2022-10-14 CN disclosed
CN-107406407-B Liquid crystal composition, polymer/liquid crystal composite material, optical element, and compound 捷恩智株式会社 2021-01-22 CN disclosed
CN-111918951-A Liquid crystal composition, monomer/liquid crystal mixture, polymer/liquid crystal composite material, liquid crystal element and chiral compound 捷恩智株式会社 2020-11-10 CN disclosed
CN-111718727-A Liquid crystal composition, mixture, polymer/liquid crystal composite material, optical switching element, and laser radar 捷恩智株式会社 2020-09-29 CN disclosed
US-20200299581-A1 OPTICALLY ISOTROPIC LIQUID CRYSTAL COMPOSITION AND OPTICAL SWITCHING DEVICE USING SAME JNC CORPORATION (JP) 2020-09-24 US disclosed
US-10633589-B2 Liquid crystal medium, optical device and liquid crystal compound JNC CORPORATION (JP) 2020-04-28 US disclosed
CN-110577836-A Liquid crystal composition for light conversion element, mixture, polymer/liquid crystal composite material, element, and laser radar 捷恩智株式会社 2019-12-17 CN disclosed
EP-2774968-B1 OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM AND OPTICAL DEVICE JNC CORP (JP) 2019-11-20 EP disclosed
US-20190316036-A1 OPTICALLY ISOTROPIC LIQUID CRYSTAL MEDIUM AND OPTICAL DEVICE JNC CORPORATION (JP) 2019-10-17 US disclosed
WO-2019198422-A1 LIQUID CRYSTAL COMPOSITION, MONOMER/(LIQUID CRYSTAL) MIXTURE, POLYMER/(LIQUID CRYSTAL) COMPOSITE MATERIAL, LIQUID CRYSTAL ELEMENT, AND CHIRAL COMPOUND JNC株式会社 2019-10-17 WO disclosed
US-6801041-B2 Sensor having electrode for determining the rate of flow of a fluid ABBOTT LABORATORIES 2004-10-05 US disclosed
US-6689316-B1 DIFFUSING INTO POLYMER MATRIX ONE OR MORE SOLUBLE SALTS THAT UNDERGO REACTION IN SITU TO FORM INSOLUBLE PHOTOSENSITIVE PRECIPITATE, AND RECORDING HOLOGRAPHIC IMAGE CAMBRIDGE UNIVERSITY TECHNICAL SERVICES, LTD. (GB) 2004-02-10 US disclosed
EP-1082643-A1 HOLOGRAPHIC SENSORS AND THEIR PRODUCTION CAMBRIDGE UNIVERSITY TECHNICAL SERVICES LIMITED (GB) 2001-03-14 EP disclosed
EP-1003796-A1 RADIATION CURABLE RESIN COMPOSITITON FOR CAST POLYMERIZATION DSM N.V. (NL) 2000-05-31 EP disclosed
WO-1999063408-A1 HOLOGRAPHIC SENSORS AND THEIR PRODUCTION CAMBRIDGE UNIVERSITY TECHNICAL SERVICES LTD. (GB) 1999-12-09 WO disclosed
WO-1999007757-A1 RADIATION CURABLE RESIN COMPOSITITON FOR CAST POLYMERIZATION DSM N.V. (NL) 1999-02-18 WO disclosed
EP-0348063-B1 THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1993-05-26 EP disclosed
US-5177171-A SULFONIC ACID GROUP-CONTAINING POLYURETHANE AND A PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1993-01-05 US disclosed
US-5053316-A THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1991-10-01 US disclosed
EP-0348063-A1 Thermoplastic elastomer and photosensitive resin composition based thereon, and printing plate precursor comprising the composition Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1989-12-27 EP disclosed