Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.54 |
| ▸ | MAPT | P10636 | 5/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.54 |
| ▸ | NPC1 | O15118 | 3/20 | 0.54 |
| ▸ | RAB9A | P51151 | 3/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.54 |
| ▸ | MAOA | P21397 | 1/20 | 0.43 |
| ▸ | MAOB | P27338 | 1/20 | 0.43 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.42 |
| ▸ | HCRTR1 | O43613 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22009280 | 0.91 | ALDH1A1 (0.47) | KDM4EMAPTALDH1A1NPC1RAB9A | |
| SCHEMBL17710557 | 0.88 | KDM4E (0.55) | KDM4EMAPTALDH1A1NPC1RAB9A | |
| SCHEMBL17710469 | 0.88 | MAPT (0.51) | KDM4EMAPTALDH1A1NPC1RAB9A | |
| SCHEMBL17710572 | 0.88 | MAPT (0.51) | KDM4EMAPTALDH1A1NPC1RAB9A | |
| SCHEMBL18573507 | 0.87 | GPR3 (0.48) | KDM4EMAPTALDH1A1NPC1RAB9A | |
| SCHEMBL11046756 | 0.85 | MAPT (0.51) | KDM4EMAPTALDH1A1NPC1RAB9A | |
| SCHEMBL166961 | 0.83 | KDM4E (0.58) | KDM4EMAPTALDH1A1NPC1RAB9A | |
| SCHEMBL29422893 | 0.83 | KDM4E (0.58) | KDM4EMAPTALDH1A1NPC1RAB9A | |
| SCHEMBL24476988 | 0.82 | GABRA1 (0.46) | KDM4EMAPTALDH1A1RAB9ATDP1 | |
| SCHEMBL21298881 | 0.81 | ALDH1A1 (0.49) | KDM4EMAPTALDH1A1RAB9AL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260035490-A1 | PHOTOPOLYMERIZATION SYNERGIST | Piedmont Chemical Industries I, LLC | 2026-02-05 | — | — | US | claimed |
| CN-119556524-A | Negative photosensitive resin composition for spacer | 上海玟昕科技有限公司 | 2025-03-04 | — | — | CN | claimed |
| US-11421049-B2 | Photopolymerization synergist | Piedmont Chemical Industries, LLC (US) | 2022-08-23 | — | — | US | claimed |
| WO-2021096751-A1 | PHOTOPOLYMERIZATION SYNERGIST | Piedmont Chemical Industries, LLC (US) | 2021-05-20 | — | — | WO | claimed |
| US-20210139616-A1 | Photopolymerization Synergist | Piedmont Chemical Industries, LLC | 2021-05-13 | — | — | US | claimed |
| CN-101432375-B | Paste composition for printing | DONGJIN SEMICHEM CO LTD | 2013-05-08 | — | — | CN | claimed |
| US-8098012-B2 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2012-01-17 | — | — | US | claimed |
| US-20090317604-A1 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2009-12-24 | — | — | US | claimed |
| US-7588877-B2 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2009-09-15 | — | — | US | claimed |
| CN-101432375-A | Paste composition for printing | DONGJIN SEMICHEM CO LTD (KR) | 2009-05-13 | — | — | CN | claimed |
| US-7378223-B2 | a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble cellulose ester compound, d) a photopolymerization initiator selected from triazines, benzophenones, acetonphenones, phosphine oxides e) a solvent(MEK) | DONGJIN SEMICHEM, CO., LTD. (KR) | 2008-05-27 | — | — | US | claimed |
| US-7300606-B2 | Pb free Ag paste composition for PDP address electrode | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-11-27 | — | — | US | claimed |
| WO-2007123324-A1 | PASTE COMPOSITION FOR PRINTING | DONGJIN SEMICHEM CO., LTD (KR) | 2007-11-01 | — | — | WO | claimed |
| US-20070060729-A1 | Photosensitive resin composition and dry film resist using the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-03-15 | — | — | US | claimed |
| US-20060115767-A1 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD., A CORPORATION ORGANIZED UNDER THE LAWS OF THE REPUBLIC OF KOREA (KR) | 2006-06-01 | — | — | US | claimed |
| US-20060011895-A1 | Pb free Ag paste composition for PDP address electrode | DONGJIN SEMICHEM CO., LTD. (KR) | 2006-01-19 | — | — | US | claimed |
| US-20050255405-A1 | Photoresist resin composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2005-11-17 | — | — | US | claimed |
| WO-2004099876-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM RESIST USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-11-18 | — | — | WO | claimed |
| WO-2004072736-A1 | AG PASTE COMPOSITION FOR MICROELECTRODE FORMATION AND MICROELECTRODE FORMED USING THE SAME | DONGJIN SEMICHEM CO. LTD. (KR) | 2004-08-26 | — | — | WO | claimed |
| US-20260035490-A1 | PHOTOPOLYMERIZATION SYNERGIST | Piedmont Chemical Industries I, LLC | 2026-02-05 | — | — | US | disclosed |
| US-12252627-B2 | Photosensitive resin composition, film prepared from the same, and electronic apparatus including the film | SAMSUNG DISPLAY CO., LTD. (KR) | 2025-03-18 | — | — | US | disclosed |
| CN-119556524-A | Negative photosensitive resin composition for spacer | 上海玟昕科技有限公司 | 2025-03-04 | — | — | CN | disclosed |
| CN-109244104-B | Optical filter of organic light emitting device and organic light emitting device including the same | 东进世美肯株式会社 | 2024-09-17 | — | — | CN | disclosed |
| CN-108693712-B | Photosensitive resin composition and electronic device including the same | 三星显示有限公司 | 2023-03-28 | — | — | CN | disclosed |
| US-20220403179-A1 | PHOTOSENSETIVE RESIN COMPOSITION, FILM PREPARED FROM THE SAME, AND ELECTRONIC APPARATUS INCLUDING THE FILM | SAMSUNG DISPLAY CO., LTD. (KR) | 2022-12-22 | — | — | US | disclosed |
| CN-115437215-A | Photosensitive resin composition, film prepared therefrom, and electronic device including the film | 三星显示有限公司 | 2022-12-06 | — | — | CN | disclosed |
| US-11421049-B2 | Photopolymerization synergist | Piedmont Chemical Industries, LLC (US) | 2022-08-23 | — | — | US | disclosed |
| CN-106959582-B | Photosensitive resin composition, film prepared using the same, and OLED device including the film | 三星显示有限公司 | 2021-11-12 | — | — | CN | disclosed |
| WO-2021096751-A1 | PHOTOPOLYMERIZATION SYNERGIST | Piedmont Chemical Industries, LLC (US) | 2021-05-20 | — | — | WO | disclosed |
| US-20210139616-A1 | Photopolymerization Synergist | Piedmont Chemical Industries, LLC | 2021-05-13 | — | — | US | disclosed |
| CN-108020988-B | Photosensitive resin composition and dry film photoresist containing same | 长春人造树脂厂股份有限公司 | 2020-11-24 | — | — | CN | disclosed |
| US-10775698-B2 | Photosensitive resin composition and electronic device including cured product of pattern-forming composition including the photosensitive resin composition | SAMSUNG DISPLAY CO., LTD. (KR) | 2020-09-15 | — | — | US | disclosed |
| EP-3407134-B1 | PHOTOSENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE INCLUDING CURED PRODUCT OF PATTERN-FORMING COMPOSITION INCLUDING THE PHOTOSENSITIVE RESIN COMPOSITION | SAMSUNG DISPLAY CO LTD (KR) | 2020-01-29 | — | — | EP | disclosed |
| EP-3407134-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE INCLUDING CURED PRODUCT OF PATTERN-FORMING COMPOSITION INCLUDING THE PHOTOSENSITIVE RESIN COMPOSITION | Samsung Display Co., Ltd. (KR) | 2018-11-28 | — | — | EP | disclosed |
| US-20180292750-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE INCLUDING CURED PRODUCT OF PATTERN-FORMING COMPOSITION INCLUDING THE PHOTOSENSITIVE RESIN COMPOSITION | SAMSUNG DISPLAY CO., LTD. (KR) | 2018-10-11 | — | — | US | disclosed |
| US-10042253-B2 | Photosensitive resin composition, film prepared by using the photosensitive resin composition, and organic light-emitting display device including the film | SAMSUNG DISPLAY CO., LTD. (KR) | 2018-08-07 | — | — | US | disclosed |
| US-20180037688-A1 | CURABLE COMPOSITION FOR IMPRINTS, CURED PRODUCT, PATTERN FORMING METHOD, LITHOGRAPHY METHOD, PATTERN AND LITHOGRAPHY MASK | FUJIFILM CORPORATION (JP) | 2018-02-08 | — | — | US | disclosed |
| US-20170199454-A1 | PHOTOSENSITIVE RESIN COMPOSITION, FILM PREPARED BY USING THE PHOTOSENSITIVE RESIN COMPOSITION, AND ORGANIC LIGHT-EMITTING DISPLAY DEVICE INCLUDING THE FILM | SAMSUNG DISPLAY CO., LTD. (KR) | 2017-07-13 | — | — | US | disclosed |
| US-9678257-B2 | Photoresist composition for green color filter | SAMSUNG DISPLAY CO., LTD. (KR) | 2017-06-13 | — | — | US | disclosed |
| US-20160327709-A1 | PHOTORESIST COMPOSITION FOR GREEN COLOR FILTER | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-11-10 | — | — | US | disclosed |
| EP-2458661-B1 | Negative active material for rechargeable lithium battery, method of producing negative electrode and rechargeable lithium battery including the same | SAMSUNG SDI CO LTD (KR) | 2015-08-05 | — | — | EP | disclosed |
| CN-103193678-B | Urethane acrylate low polymer and preparation method and application thereof | ETERNAL GUANGZHOU ELECTRONIC MATERIAL CO LTD | 2014-07-02 | — | — | CN | disclosed |
| US-20140111962-A1 | TOUCH SCREEN PANEL | DONGWOO FINE-CHEM CO., LTD. (KR) | 2014-04-24 | — | — | US | disclosed |
| US-20140087064-A1 | TOUCH SCREEN PANEL AND METHOD OF PREPARING THE SAME | DONGWOO FINE-CHEM CO., LTD. (KR) | 2014-03-27 | — | — | US | disclosed |
| US-20140075750-A1 | TOUCH SCREEN PANEL AND METHOD OF PREPARING THE SAME | DONGWOO FINE-CHEM CO., LTD. (KR) | 2014-03-20 | — | — | US | disclosed |
| CN-102633984-B | Polyurethane-acrylate oligomer, and synthesis method and application thereof | ETERNAL GUANGZHOU ELECTRONIC MATERIAL CO LTD | 2013-12-25 | — | — | CN | disclosed |
| CN-103193678-A | Urethane acrylate low polymer and preparation method and application thereof | ETERNAL GUANGZHOU ELECTRONIC MATERIAL CO LTD | 2013-07-10 | — | — | CN | disclosed |
| CN-101432375-B | Paste composition for printing | DONGJIN SEMICHEM CO LTD | 2013-05-08 | — | — | CN | disclosed |
| CN-102633984-A | Polyurethane-acrylate oligomer, and synthesis method and application thereof | ETERNAL GUANGZHOU ELECTRONIC MATERIAL CO LTD | 2012-08-15 | — | — | CN | disclosed |
| US-20120135307-A1 | NEGATIVE ACTIVE MATERIAL FOR RECHARGEABLE LITHIUM BATTERY, METHOD OF PRODUCING NEGATIVE ELECTRODE AND RECHARGEABLE LITHIUM BATTERY INCLUDING SAME | SAMSUNG SDI., LTD. (KR) | 2012-05-31 | — | — | US | disclosed |
| EP-2458661-A1 | Negative active material for rechargeable lithium battery, method of producing negative electrode and rechargeable lithium battery including same | Samsung SDI Co., Ltd. (KR) | 2012-05-30 | — | — | EP | disclosed |
| US-8098012-B2 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2012-01-17 | — | — | US | disclosed |
| CN-1749334-B | Ink composition and color filter including the same | SAMSUNG ELECTRONICS CO LTD | 2011-04-06 | — | — | CN | disclosed |
| US-7811726-B2 | Photoresist composition and method of manufacturing a color filter substrate by using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-10-12 | — | — | US | disclosed |
| US-7763402-B2 | Photosensitive resin composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2010-07-27 | — | — | US | disclosed |
| US-20100021832-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A COLOR FILTER SUBSTRATE BY USING THE SAME | TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) | 2010-01-28 | — | — | US | disclosed |
| US-20090317604-A1 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2009-12-24 | — | — | US | disclosed |
| US-7615322-B2 | Photoresist composition and method of manufacturing a color filter substrate by using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-11-10 | — | — | US | disclosed |
| US-7611826-B2 | Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-11-03 | — | — | US | disclosed |
| US-7588877-B2 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2009-09-15 | — | — | US | disclosed |
| US-20090191484-A1 | PHOTOSENSITIVE RESIN COMPOSITION CONTROLLING SOLUBILITY AND PATTERN FORMATION METHOD OF DOUBLE-LAYER STRUCTURE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-07-30 | — | — | US | disclosed |
| CN-101432375-A | Paste composition for printing | DONGJIN SEMICHEM CO LTD (KR) | 2009-05-13 | — | — | CN | disclosed |
| US-7378223-B2 | a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble cellulose ester compound, d) a photopolymerization initiator selected from triazines, benzophenones, acetonphenones, phosphine oxides e) a solvent(MEK) | DONGJIN SEMICHEM, CO., LTD. (KR) | 2008-05-27 | — | — | US | disclosed |
| US-20080051483-A1 | PHOTOSENSITIVE RESIN COMPOSITION | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-02-28 | — | — | US | disclosed |
| US-20080044766-A1 | a coloring agent including an anthraquinone-based dye and an organic pigment; a meta-cresol-formaldehyde novolak resin binder, hexakis/methoxymethyl/melamine crosslinker and propylene glycol methyl ether propionate as a solvent, benzophenone photopolymerization initiator; exposing to light, developing | SAMSUNG ELECTRONICS CO., LTD. | 2008-02-21 | — | — | US | disclosed |
| US-7300606-B2 | Pb free Ag paste composition for PDP address electrode | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-11-27 | — | — | US | disclosed |
| WO-2007123324-A1 | PASTE COMPOSITION FOR PRINTING | DONGJIN SEMICHEM CO., LTD (KR) | 2007-11-01 | — | — | WO | disclosed |
| CN-100334506-C | Photosensitive resin composition using photosensitive resin | DONGJIN SEMIKAN CO LTD (KR) | 2007-08-29 | — | — | CN | disclosed |
| US-20070060729-A1 | Photosensitive resin composition and dry film resist using the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-03-15 | — | — | US | disclosed |
| US-20060115767-A1 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD., A CORPORATION ORGANIZED UNDER THE LAWS OF THE REPUBLIC OF KOREA (KR) | 2006-06-01 | — | — | US | disclosed |
| CN-1749334-A | Composition for ink and the colour filter that comprises said composition | SAMSUNG ELECTRONICS CO LTD (KR) | 2006-03-22 | — | — | CN | disclosed |
| US-20060011895-A1 | Pb free Ag paste composition for PDP address electrode | DONGJIN SEMICHEM CO., LTD. (KR) | 2006-01-19 | — | — | US | disclosed |
| US-20050255405-A1 | Photoresist resin composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2005-11-17 | — | — | US | disclosed |
| WO-2004099876-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM RESIST USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-11-18 | — | — | WO | disclosed |
| WO-2004072736-A1 | AG PASTE COMPOSITION FOR MICROELECTRODE FORMATION AND MICROELECTRODE FORMED USING THE SAME | DONGJIN SEMICHEM CO. LTD. (KR) | 2004-08-26 | — | — | WO | disclosed |
| US-20040115558-A1 | Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same | DONGJIM SEMICHEM CO., LTD. (KR) | 2004-06-17 | — | — | US | disclosed |
| CN-1497343-A | Photoresist compound using photoresist | 东进瑟弥侃株式会社 | 2004-05-19 | — | — | CN | disclosed |
| CN-1497343-A | Photoresist compound using photoresist | 东进瑟弥侃株式会社 | 2004-05-19 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260035490-A1 | PHOTOPOLYMERIZATION SYNERGIST | EEF1D, ARCN1, RPS4Y1 | KDM4E 284/4885MAPT 749/4885ALDH1A1 788/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.