Potassium Ion

Potassium Ion

SCHEMBL334038

[C-]#N.[C-]#N.[C-]#N.[Cu+2].[K+]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL9872003 0.91 CA1 (0.43)
SCHEMBL11061081 0.89 CA1 (0.60)
Potassium Ion SCHEMBL1331713 0.89
Potassium Ion SCHEMBL1811073 0.89
Potassium Ion SCHEMBL1332472 0.89
Potassium Ion SCHEMBL4239524 0.89 CA1 (0.60)
Potassium Ion SCHEMBL1284 0.89
SCHEMBL17438 0.89
Potassium Ion SCHEMBL1332522 0.89
SCHEMBL11759143 0.89 CA1 (0.60)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 267 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025095846-A1 PREPARATION OF METALLENES KASHIWAYA SHUN (SE) 2025-05-08 WO claimed
CN-119946994-A Ultra-thin copper foil with carrier and manufacturing method thereof 南亚塑胶工业股份有限公司 2025-05-06 CN claimed
US-20250137155-A1 CARRIER-ATTACHED ULTRA-THIN COPPER FOIL AND METHOD FOR PRODUCING THE SAME NAN YA PLASTICS CORPORATION (TW) 2025-05-01 US claimed
CN-117410556-A Preparation method, product and application of modified polymer electrolyte 西安工业大学 2024-01-16 CN claimed
CN-107447237-B Slip ring with reduced contact noise 史莱福灵有限公司 2021-04-20 CN claimed
CN-109985648-A Porous cubic double-metal phosphide catalyst of one kind and its preparation method and application 安徽大学 2019-07-09 CN claimed
EP-3170924-A1 ELECTROLYTE AND METHOD FOR ELECTROLYTIC DEPOSITION OF GOLD-COPPER ALLOYS Enthone, Inc. (US) 2017-05-24 EP claimed
US-8282801-B2 Methods for passivating a metal substrate and related coated metal substrates PPG INDUSTRIES OHIO, INC. (US) 2012-10-09 US claimed
US-20120171367-A1 DISPLACEMENT GOLD PLATING SOLUTION AND METHOD FOR FORMING CONNECTING PORTION ELECTROPLATING ENGINEERS OF JAPAN LIMITED (JP) 2012-07-05 US claimed
EP-1983077-A1 Electrolyte and method for electrolytic deposition of gold-copper alloys Enthone, Inc. (US) 2008-10-22 EP claimed
WO-2006103550-A1 PROCESSES FOR THE PREPARATION OF CITALOPRAM AND ITS INTERMEDIATE 5-AMINOPHTHALIDE RANBAXY LABORATORIES LIMITED (US) 2006-10-05 WO claimed
US-7011697-B2 Electroless gold plating solution KANTO KAGAKU KABUSHIKI KAISHA (JP) 2006-03-14 US claimed
US-20060027462-A1 Copper strike plating bath SHINKO ELECTRIC INDUSTRIES CO., LTD. (JP) 2006-02-09 US claimed
US-20050098061-A1 Electroless gold plating solution KANTO KAGAKU KABUSHIKI KAISHA (JP) 2005-05-12 US claimed
JP-6013753-A None JP disclosed
JP-2043372-A None JP disclosed
JP-56079459-A None JP disclosed
JP-S5679459-A PRETREATMENT METHOD FOR PLATING OF EXTERNAL LEAD WIRE AFTER SEMICONDUCTOR MOLDING NOGE DENKI KOGYO:KK 1981-06-30 JP disclosed
US-4251327-A Electroplating method MOTOROLA, INC. (US) 1981-02-17 US disclosed
EP-0018803-A1 Process for preparation of aromatic tertiary hydroperoxides and phenols prepared therefrom MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1980-11-12 EP disclosed