SCHEMBL3340550

SCHEMBL3340550

CCO[SiH](CC(C)Cc1ccccc1)OCC

nearest known ligand 0.45

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 6/20 0.42
TAAR1 Q96RJ0 4/20 0.42
SLC6A2 P23975 3/20 0.42
SLC6A4 P31645 2/20 0.42
SLC6A3 Q01959 2/20 0.42
MAOA P21397 1/20 0.42
CYP2A6 P11509 1/20 0.42
ADORA2A P29274 1/20 0.42
ADORA1 P30542 1/20 0.42
TRPA1 O75762 2/20 0.41
SLC18A2 Q05940 1/20 0.40
CYP2D6 P10635 1/20 0.40
ADRA2B P18089 1/20 0.37
ADRA2C P18825 1/20 0.37
HTR2A P28223 1/20 0.37
ADRA1A P35348 1/20 0.37
OPRK1 P41145 1/20 0.37
KCNH2 Q12809 1/20 0.37
EPHX1 P07099 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3339010 0.81 SIGMAR1 (0.45) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL16714809 0.76 SIGMAR1 (0.56) SIGMAR1TAAR1
SCHEMBL1501527 0.74 SIGMAR1 (0.45) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL8767509 0.74 TAAR1 (0.45) TAAR1TRPA1
SCHEMBL4785594 0.73 SIGMAR1 (0.64) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL3165621 0.73 SIGMAR1 (0.48) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL123780 0.72 TP53 (0.44) TAAR1SLC6A2CYP2D6
Benzene SCHEMBL3082124 0.72 TRPA1 (0.57) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL199315 0.72 TRPA1 (0.57) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL28051645 0.72 TRPA1 (0.57) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed