Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADAMTS4 | O75173 | 1/20 | 0.49 |
| ▸ | MMP2 | P08253 | 4/20 | 0.48 |
| ▸ | MMP9 | P14780 | 4/20 | 0.48 |
| ▸ | MMP8 | P22894 | 4/20 | 0.48 |
| ▸ | MMP13 | P45452 | 3/20 | 0.48 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.42 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.42 |
| ▸ | MMP3 | P08254 | 1/20 | 0.41 |
| ▸ | MMP12 | P39900 | 1/20 | 0.41 |
| ▸ | MMP14 | P50281 | 1/20 | 0.41 |
| ▸ | MMP16 | P51512 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3340749 | 1.00 | ADAMTS4 (0.49) | ADAMTS4MMP2MMP9MMP8MMP13 | |
| SCHEMBL14969086 | 0.89 | ADAMTS4 (0.59) | ADAMTS4MMP2MMP9MMP8MMP13 | |
| SCHEMBL11366155 | 0.85 | ALDH1A1 (0.42) | ADAMTS4MMP2MMP9MMP8MMP13 | |
| SCHEMBL31467993 | 0.85 | SLC6A2 (0.44) | ADAMTS4MMP2MMP9MMP8MMP13 | |
| SCHEMBL11201192 | 0.83 | ALDH1A1 (0.41) | ADAMTS4MMP2MMP9MMP8MMP13 | |
| SCHEMBL14843771 | 0.83 | CHRM5 (0.42) | ADAMTS4MMP2MMP9MMP8MMP13 | |
| SCHEMBL11587403 | 0.82 | SLC6A2 (0.41) | ADAMTS4MMP2MMP9MMP8MMP13 | |
| SCHEMBL29173923 | 0.81 | CYP2D6 (0.57) | SLC6A2SLC6A4ALDH1A1LMNATP53 | |
| SCHEMBL26324873 | 0.80 | TSHR (0.41) | ADAMTS4MMP2MMP9MMP8MMP13 | |
| SCHEMBL14497056 | 0.79 | SLC6A2 (0.39) | ADAMTS4MMP2MMP9MMP8MMP13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | claimed |
| CN-120077329-A | Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern | 旭化成株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-118159908-A | Photosensitive element and method for forming resist pattern | 旭化成株式会社 | 2024-06-07 | — | — | CN | disclosed |
| WO-2024085254-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2024-04-25 | — | — | WO | disclosed |
| WO-2023074325-A1 | PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2023-05-04 | — | — | WO | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| CN-101075090-A | Dry film corrosion resisting agent | ASAHI CHEMICAL ELECTRONIC MATE (JP) | 2007-11-21 | — | — | CN | disclosed |
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | disclosed |
| EP-0295044-B1 | PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 1992-04-22 | — | — | EP | disclosed |
| US-4987057-A | HIGH SENSITIVITY TO VISIBLE LIGHT RAYS | HITACHI CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |
| EP-0295044-A2 | Photoinitiator and photopolymerizable composition using the same | Hitachi Chemical Co., Ltd. (JP) | 1988-12-14 | — | — | EP | disclosed |
| US-4411912-A | Insecticidal isovaleric acid esters | ZOECON CORPORATION (US) | 1983-10-25 | — | — | US | disclosed |
| US-4243819-A | Substituted amino acids | ZOECON CORPORATION (US) | 1981-01-06 | — | — | US | disclosed |