SCHEMBL3341200

SCHEMBL3341200

O=C(O)c1c(F)c(F)c(Oc2c(Cl)c(Cl)c(Oc3c(F)c(F)c(C(=O)O)c(C(=O)O)c3F)c(Cl)c2Cl)c(F)c1C(=O)O

nearest known ligand 0.38

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.38
CES1 P23141 1/20 0.38
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
CYP2C9 P11712 2/20 0.33
CYP1A2 P05177 1/20 0.33
KDM4E B2RXH2 1/20 0.32
ALDH1A1 P00352 1/20 0.32
HSD17B10 Q99714 1/20 0.32
HPGD P15428 1/20 0.31
HTT P42858 1/20 0.31
TSHR P16473 2/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
GFER P55789 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29404409 1.00 CES2 (0.38) CES2CES1MEN1KMT2ACYP2C9
SCHEMBL4594249 0.90 CES2 (0.36) CES2CES1MEN1KMT2ACYP2C9
SCHEMBL29405294 0.89 MEN1 (0.37) CES2CES1MEN1KMT2ACYP2C9
SCHEMBL3646838 0.89 MEN1 (0.37) CES2CES1MEN1KMT2ACYP2C9
SCHEMBL714064 0.89 MEN1 (0.37) CES2CES1MEN1KMT2ACYP2C9
SCHEMBL3342096 0.88 CES2 (0.38) CES2CES1KDM4EALDH1A1HSD17B10
SCHEMBL20262187 0.85 MEN1 (0.35) CES2CES1MEN1KMT2ACYP2C9
SCHEMBL8576244 0.83 MEN1 (0.34) MEN1KMT2ACYP2C9CYP1A2HSD17B10
SCHEMBL712618 0.83 MEN1 (0.34) MEN1KMT2ACYP2C9CYP1A2HSD17B10
SCHEMBL4594690 0.82 MEN1 (0.33) MEN1KMT2ACYP2C9CYP1A2HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7217827-B2 Halogen-containing aromatic compound NIPPON SHOKUBAI CO., LTD. (JP) 2007-05-15 US claimed
US-20050090691-A1 Halogen-containing aromatic compound NIPPON SHOKUBAI CO., LTD., A JAPAN CORPORATION 2005-04-28 US claimed
US-20030018204-A1 Halogen-containing aromatic compound NIPPON SHOKUBAI CO., LTD. (JP) 2003-01-23 US claimed
US-10696845-B2 Energy-sensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 2020-06-30 US disclosed
EP-3275940-B1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2019-12-18 EP disclosed
US-20190225804-A1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2019-07-25 US disclosed
EP-3275940-A1 ENERGY-SENSITIVE RESIN COMPOSITION Tokyo Ohka Kogyo Co., Ltd. (JP) 2018-01-31 EP disclosed
US-20100150510-A1 FLEXIBLE OPTICAL WAVEGUIDE, PROCESS FOR ITS PRODUCTION, AND EPOXY RESIN COMPOSITION FOR FLEXIBLE OPTICAL WAVEGUIDES NIPPON SHOKUBAI CO., LTD 2010-06-17 US disclosed
EP-1275679-B1 Polyamide acid and polyimide, and optical material NIPPON CATALYTIC CHEM IND (JP) 2009-04-29 EP disclosed
US-7409139-B2 Halogenated polyamide acid composition and its applications NIPPON SHOKUBAI CO., LTD. (JP) 2008-08-05 US disclosed
US-7364771-B2 Method and apparatus for production of fluorine-containing polyimide film NIPPON SHOKUBAI CO., LTD. (JP) 2008-04-29 US disclosed
US-6916959-B2 Halogen-containing aromatic compound NIPPON SHOKUBAI CO., LTD. (JP) 2005-07-12 US disclosed
US-20050090691-A1 Halogen-containing aromatic compound NIPPON SHOKUBAI CO., LTD., A JAPAN CORPORATION 2005-04-28 US disclosed
US-20040234686-A1 Method and apparatus for production of fluorine-containing polyimide film NIPPON SHOKUBAI CO., LTD. (JP) 2004-11-25 US disclosed
EP-1462436-A1 Halogen-containing aromatic compound Nippon Shokubai Co., Ltd. (JP) 2004-09-29 EP disclosed
EP-1454945-A1 Method and apparatus for production of fluorine-containing polyimide film Nippon Shokubai Co., Ltd. (JP) 2004-09-08 EP disclosed
US-20030050407-A1 Polyamide acid and polyimide, and optical material NIPPON SHOKUBAI CO., LTD (JP) 2003-03-13 US disclosed
US-20030018204-A1 Halogen-containing aromatic compound NIPPON SHOKUBAI CO., LTD. (JP) 2003-01-23 US disclosed
EP-1275679-A1 Polyamide acid and polyimide, and optical material Nippon Shokubai Co., Ltd. (JP) 2003-01-15 EP disclosed
EP-1256564-A1 Halogen-containing aromatic compound Nippon Shokubai Co., Ltd. (JP) 2002-11-13 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050090691-A1 Halogen-containing aromatic compound TYR, AFF4, DDT CES2 2043/4885CES1 4620/4885MEN1 492/4885
US-20030018204-A1 Halogen-containing aromatic compound TYR, AFF4, DDT CES2 2043/4885CES1 4620/4885MEN1 492/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.