Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.69 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.69 |
| ▸ | HPGD | P15428 | 4/20 | 0.69 |
| ▸ | GAA | P10253 | 2/20 | 0.69 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.51 |
| ▸ | GLA | P06280 | 3/20 | 0.50 |
| ▸ | POLB | P06746 | 3/20 | 0.50 |
| ▸ | MAOA | P21397 | 2/20 | 0.50 |
| ▸ | CASP1 | P29466 | 2/20 | 0.50 |
| ▸ | CASP7 | P55210 | 2/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.50 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.50 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.50 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.50 |
| ▸ | NQO2 | P16083 | 1/20 | 0.50 |
| ▸ | DRD1 | P21728 | 1/20 | 0.50 |
| ▸ | ACHE | P22303 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL10800767 | 0.98 | KDM4E (0.67) | KDM4EALDH1A1HPGDGAACYP1A2 | |
| SCHEMBL11703072 | 0.84 | KDM4E (0.51) | KDM4EALDH1A1HPGDGAACYP1A2 | |
| SCHEMBL3343659 | 0.82 | KDM4E (1.00) | KDM4EALDH1A1HPGDGAACYP1A2 | |
| SCHEMBL10496106 | 0.81 | GPR3 (0.53) | KDM4EALDH1A1HPGDGAACYP1A2 | |
| SCHEMBL28158705 | 0.81 | TLR8 (0.56) | KDM4EALDH1A1HPGDGAACYP1A2 | |
| Ammonia Solution, Strong SCHEMBL29175740 | 0.81 | GPR3 (0.53) | KDM4EALDH1A1HPGDGAACYP1A2 | |
| SCHEMBL14533471 | 0.81 | KDM4E (0.53) | KDM4EALDH1A1HPGDGAACYP1A2 | |
| SCHEMBL28002147 | 0.81 | KDM4E (0.53) | KDM4EALDH1A1HPGDGAACYP1A2 | |
| SCHEMBL29660681 | 0.81 | MAOA (0.50) | KDM4EALDH1A1HPGDGAACYP1A2 | |
| SCHEMBL19009445 | 0.81 | MAOA (0.50) | KDM4EALDH1A1HPGDGAACYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 216 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-111752097-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752100-A | Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752098-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-106233205-B | Photosensitive element, laminate, permanent mask resist, method for producing same, and method for producing semiconductor package | 日立化成株式会社 | 2020-06-23 | — | — | CN | claimed |
| CN-110357989-A | Tertiary amine photosensitizer, preparation method, comprising its photosensitive polymer combination and photosensitive polymer combination application | 常州强力电子新材料股份有限公司 | 2019-10-22 | — | — | CN | claimed |
| CN-101290471-B | Photoresist combination and laminating body | ASAHI KASEI EMD CORP | 2011-07-06 | — | — | CN | claimed |
| CN-101290471-A | Photoresist combination and laminating body | ASAHI KASEI EMD CORP (JP) | 2008-10-22 | — | — | CN | claimed |
| US-6156870-A | Resin composition which can be cured by application of heat or irradiation of light, film, laminate and production of multilayer wiring board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2000-12-05 | — | — | US | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| EP-4067998-B1 | EO/PO MODIFIED 9-PHENYLACRIDINE PHOTOSENSITIZERS FOR USE IN PHOTOSENSITIVE RESINS IN THE MANUFACTURE OF PRINTED CIRCUIT BOARDS | CHANGZHOU TRONLY NEW ELECTRONIC MAT CO LTD (CN) | 2025-11-12 | — | — | EP | disclosed |
| US-12353130-B2 | Photosensitive resin composition and photosensitive resin multilayer body | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-07-08 | — | — | US | disclosed |
| CN-120044756-A | Photosensitive resin composition | 旭化成株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-115524922-B | Photosensitive resin composition | 旭化成株式会社 | 2025-02-18 | — | — | CN | disclosed |
| WO-2025018412-A1 | PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CONDUCTOR PATTERN | 旭化成株式会社 | 2025-01-23 | — | — | WO | disclosed |
| EP-0547142-A4 | — | MICROPROBE CORP (US) | 1995-01-18 | — | — | EP | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |
| US-5334484-A | Using an acridine compound as photoinitiator | HITACHI CHEMICAL CO., LTD. (JP) | 1994-08-02 | — | — | US | disclosed |
| EP-0547142-A1 | SOLID SUPPORT SYNTHESIS OF 3'-TAILED OLIGONUCLEOTIDES VIA A LINKING MOLECULE | EPOCH PHARMACEUTICALS, INC. (US) | 1993-06-23 | — | — | EP | disclosed |
| WO-1992003464-A1 | SOLID SUPPORT SYNTHESIS OF 3'-TAILED OLIGONUCLEOTIDES VIA A LINKING MOLECULE | MICROPROBE CORPORATION (US) | 1992-03-05 | — | — | WO | disclosed |