Styrene

Styrene

SCHEMBL3343449

C=C(CC=C(C)C(=O)O)C(=O)OC.C=Cc1ccccc1

nearest known ligand 0.43

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.41
ALDH1A1 P00352 3/20 0.38
TSHR P16473 1/20 0.38
CYP2C9 P11712 1/20 0.35
RECQL P46063 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
LMNA P02545 1/20 0.33
APEX1 P27695 1/20 0.33
HTT P42858 1/20 0.33
HIF1A Q16665 1/20 0.33
TAS1R3 Q7RTX0 2/20 0.33
TAS1R1 Q7RTX1 2/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL9699304 0.90 MEN1 (0.39) AKR1C3ALDH1A1MEN1KMT2ALMNA
Styrene SCHEMBL8681115 0.88 MEN1 (0.42) AKR1C3ALDH1A1MEN1KMT2ALMNA
Styrene SCHEMBL3757753 0.87 AKR1C3 (0.47) AKR1C3ALDH1A1TSHRCYP2C9RECQL
Styrene SCHEMBL209286 0.87 AKR1C3 (0.40) AKR1C3ALDH1A1TSHRCYP2C9MEN1
Styrene SCHEMBL16753059 0.86 AKR1C3 (0.33) AKR1C3ALDH1A1MEN1KMT2AAPEX1
Styrene SCHEMBL6509931 0.86 TSHR (0.44) ALDH1A1TSHRMEN1KMT2ALMNA
Styrene SCHEMBL8106691 0.86 MEN1 (0.40) AKR1C3ALDH1A1TSHRMEN1KMT2A
SCHEMBL11581747 0.85 LMNA (0.39) AKR1C3ALDH1A1LMNANPC1RAB9A
Styrene SCHEMBL194521 0.85 ALDH1A1 (0.43) AKR1C3ALDH1A1TSHRCYP2C9MEN1
Styrene SCHEMBL28052240 0.84 ALDH1A1 (0.44) ALDH1A1TSHRMEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115094645-B Rapid large-area preparation method of bionic photonic crystal structure chromogenic fabric 浙江理工大学 2024-04-30 CN claimed
CN-114164661-B Large-area preparation method of high-stability high-saturation photonic crystal structure chromogenic fabric 浙江理工大学 2024-04-19 CN claimed
US-11815658-B2 Transparent films based on resin components having a high glass transition temperature TRINSEO EUROPE GMBH (CH) 2023-11-14 US claimed
EP-3583160-B1 TRANSPARENT FILMS BASED ON RESIN COMPONENTS HAVING A HIGH GLASS TRANSITION TEMPERATURE TRINSEO EUROPE GMBH (CH) 2023-06-28 EP claimed
US-20220411552-A1 ACID-FUNCTIONALIZED COPOLYMERS OF METHYL METHACRYLATE AND ACRYLIC RESIN COMPOSITIONS BASED THEREON TRINSEO EUROPE GMBH (CH) 2022-12-29 US claimed
CN-113621110-B Unclonable anti-counterfeiting material based on nanosphere self-assembly and preparation method and application thereof 广东工业大学 2022-12-16 CN claimed
CN-115094645-A Rapid large-area preparation method of bionic photonic crystal structure color-generating fabric 浙江理工大学 2022-09-23 CN claimed
CN-114164661-A Large-area preparation method of high-stability high-saturation photonic crystal structure color-generating fabric 浙江理工大学 2022-03-11 CN claimed
CN-113621110-A Unclonable anti-counterfeiting material based on nanosphere self-assembly and preparation method and application thereof 广东工业大学 2021-11-09 CN claimed
CN-111379174-A Structural color-generating finishing liquid for preparing high-stability photonic crystal and application 浙江理工大学 2020-07-07 CN claimed
WO-2018152522-A1 TRANSPARENT FILMS BASED ON RESIN COMPONENTS HAVING A HIGH GLASS TRANSITION TEMPERATURE ARKEMA FRANCE (FR) 2018-08-23 WO claimed
US-20240219833-A1 BLACK RESIST COMPOSITION, AND METHOD FOR FORMING BLACK PATTERN BY NEAR-INFRARED PHOTOLITHOGRAPHIC METHOD ECHEM SOLUTIONS JAPAN INC. (JP) 2024-07-04 US disclosed
CN-115094645-B Rapid large-area preparation method of bionic photonic crystal structure chromogenic fabric 浙江理工大学 2024-04-30 CN disclosed
CN-114164661-B Large-area preparation method of high-stability high-saturation photonic crystal structure chromogenic fabric 浙江理工大学 2024-04-19 CN disclosed
EP-4339701-A1 BLACK RESIST COMPOSITION AND METHOD FOR FORMING BLACK PATTERN BY NEAR-INFRARED PHOTOLITHOGRAPHY Echem Solutions Japan Inc. (JP) 2024-03-20 EP disclosed
US-4439582-A Blends of aromatic polycarbonate with random copolymers of a monovinylidene aromatic and an unsaturated carboxylic acid THE DOW CHEMICAL COMPANY (US) 1984-03-27 US disclosed
EP-0056247-A2 Heterogeneous blends of aromatic polycarbonate with random copolymers of a monovinylidene aromatic and an unsaturated carboxylic acid THE DOW CHEMICAL COMPANY (US) 1982-07-21 EP disclosed
US-4081583-A DIELECTRIC FILM PREPARED FROM A WATER INSOLUBLE ADDITION POLYMER, AND AN AMMONIUM OR AMINE SALT OF AN ADDITION POLYMER JAPAN SYNTHETIC RUBBER CO., LTD. (JA) 1978-03-28 US disclosed
US-4081584-A DIELECTRIC FILM PREPARED FROM AN AQUEOUS DISPERSION OF A WATER INSOLUBLE ADDITION POLYMER AND AN AMMONIUM OR AMINE SALT OF AN ADDITION COPOLYMER JAPAN SYNTHETIC RUBBER CO., LTD. (JA) 1978-03-28 US disclosed
US-4013595-A Non-flammable rug cleaning composition S. C. JOHNSON & SON, INC. (US) 1977-03-22 US disclosed