Styrene

Styrene

SCHEMBL9699304

C=C(CC=C(C)C(=O)O)C(=O)OC.C=CC(=O)OCC.C=Cc1ccccc1

nearest known ligand 0.39

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.39
KMT2A Q03164 5/20 0.39
ALDH1A1 P00352 4/20 0.35
LMNA P02545 4/20 0.35
KDM4E B2RXH2 2/20 0.35
MAPT P10636 6/20 0.34
THRB P10828 1/20 0.34
RAB9A P51151 2/20 0.34
ADORA3 P0DMS8 2/20 0.34
MCL1 Q07820 1/20 0.34
AKR1C3 P42330 1/20 0.34
L3MBTL1 Q9Y468 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
MAPK1 P28482 1/20 0.33
NPC1 O15118 1/20 0.33
HPGD P15428 1/20 0.32
XBP1 P17861 1/20 0.32
MDM4 O15151 1/20 0.32
MDM2 Q00987 1/20 0.32
GAA P10253 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL3343449 0.90 AKR1C3 (0.41) MEN1KMT2AALDH1A1LMNARAB9A
Styrene SCHEMBL6509931 0.90 TSHR (0.44) MEN1KMT2AALDH1A1LMNAKDM4E
Acrylic Acid Ethyl Ester SCHEMBL1486048 0.89 TSHR (0.35) ALDH1A1THRBHPGD
Styrene SCHEMBL8681115 0.88 MEN1 (0.42) MEN1KMT2AALDH1A1LMNAKDM4E
Acrylic Acid Ethyl Ester SCHEMBL6017688 0.86 ALOX15 (0.35) ALDH1A1HPGD
Acrylic Acid Ethyl Ester SCHEMBL9698333 0.86 TSHR (0.33) ALDH1A1HPGD
Styrene SCHEMBL5820294 0.84 MEN1 (0.43) MEN1KMT2AALDH1A1LMNAKDM4E
Styrene SCHEMBL1087501 0.84 MEN1 (0.46) MEN1KMT2AALDH1A1LMNAKDM4E
Acrylic Acid Ethyl Ester SCHEMBL10601689 0.83 ALDH1A1 (0.36) MEN1KMT2AALDH1A1MAPTRAB9A
SCHEMBL10336731 0.83 ALDH1A1 (0.41) MEN1KMT2AALDH1A1LMNATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0475287-A2 Process for defined etching of substrates E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-03-18 EP disclosed
US-5043244-A Process for defined etching of substrates E. I. DU PONT DE NEMOURS AND COMPANY (US) 1991-08-27 US disclosed