⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7130041 | 0.79 | — | — | |
| SCHEMBL1331497 | 0.79 | LTA4H (0.30) | — | |
| SCHEMBL7021871 | 0.77 | — | — | |
| SCHEMBL11687259 | 0.75 | — | — | |
| SCHEMBL5017147 | 0.74 | — | — | |
| SCHEMBL5023745 | 0.74 | — | — | |
| Pyrene SCHEMBL29144860 | 0.72 | ALDH1A1 (0.34) | — | |
| Hydrochloric Acid SCHEMBL7402430 | 0.71 | CYP3A4 (0.46) | — | |
| SCHEMBL6806822 | 0.68 | — | — | |
| SCHEMBL27925099 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8097708-B2 | 10a-Azalide compound | TAISHO PHARMACEUTICAL CO., LTD. (JP) | 2012-01-17 | — | — | US | disclosed |
| US-20090281292-A1 | 10a-Azalide Compound | MEIJI SEIKA PHARMA CO., LTD. (JP) | 2009-11-12 | — | — | US | disclosed |
| US-20080268374-A1 | Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| EP-1985620-A1 | 10a-AZALIDE COMPOUND | TAISHO PHARMACEUTICAL CO., LTD (JP) | 2008-10-29 | — | — | EP | disclosed |
| EP-1945606-A1 | ALKYLCARBAMOYL NAPHTHALENYLOXY- OCTENOYLHYDROXYAMIDE DERIVATIVES HAVING INHIBITORY ACTIVITY AGAINST HISTONE DEACETYLASE AND PREPARATION THEREOF | Korea Research Institute of Chemical Technology (KR) | 2008-07-23 | — | — | EP | disclosed |
| WO-2007052938-A1 | ALKYLCARBAMOYL NAPHTHALENYLOXY- OCTENOYLHYDROXYAMIDE DERIVATIVES HAVING INHIBITORY ACTIVITY AGAINST HISTONE DEACETYLASE AND PREPARATION THEREOF | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2007-05-10 | — | — | WO | disclosed |
| EP-1780599-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, PHOTOSENSITIVE LAMINATE, PATTERN FORMING APPARATUS AND METHOD OF PATTERN FORMATION | FUJIFILM Corporation (JP) | 2007-05-02 | — | — | EP | disclosed |
| EP-0315349-B1 | PHOSPHOLIPASE A2 INHIBITING COMPOSITIONS AND THEIR USE | YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM (IL) | 1993-02-03 | — | — | EP | disclosed |
| US-5064817-A | PHOSPHOLIPASE A2 INHIBITING COMPOSITIONS AND THEIR USE | YISSUM RESEARCH DEVELOPMENT COMPANY OF HEBREW UNIVERSITY OF JERUSALEM (IL) | 1991-11-12 | — | — | US | disclosed |
| EP-0315349-A1 | Phospholipase A2 inhibiting compositions and their use | YISSUM RESEARCH DEVELOPMENT COMPANY OF THE HEBREW UNIVERSITY OF JERUSALEM (IL) | 1989-05-10 | — | — | EP | disclosed |