SCHEMBL3367546

SCHEMBL3367546

CCCCCCCCS(=O)(=O)[O-].CCCCOC(=O)OC1CC[S+](c2cccc3ccccc23)C1

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR1 P21554 3/20 0.33
CNR2 P34972 3/20 0.33
MTNR1A P48039 1/20 0.32
KDM4E B2RXH2 3/20 0.32
KMT2A Q03164 2/20 0.32
L3MBTL1 Q9Y468 2/20 0.32
SLC2A1 P11166 1/20 0.32
CYP2C9 P11712 1/20 0.32
MAPT P10636 2/20 0.31
ALDH1A1 P00352 5/20 0.31
RXFP1 Q9HBX9 1/20 0.31
HPGD P15428 1/20 0.31
MEN1 O00255 1/20 0.31
NPC1 O15118 1/20 0.31
POLB P06746 1/20 0.31
TSHR P16473 1/20 0.31
LMNA P02545 1/20 0.31
ELANE P08246 1/20 0.31
HSD17B10 Q99714 1/20 0.30
HTR3E A5X5Y0 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3362985 0.97 CNR1 (0.33) CNR1CNR2MTNR1AKDM4EKMT2A
SCHEMBL3365992 0.94 ALDH1A1 (0.35) CNR1CNR2KDM4EKMT2AL3MBTL1
SCHEMBL3365940 0.91 KDM4E (0.37) CNR1CNR2KDM4EKMT2AL3MBTL1
SCHEMBL3367541 0.89 KDM4E (0.32) CNR1CNR2KDM4EKMT2AL3MBTL1
SCHEMBL3364441 0.89 KDM4E (0.37) CNR1CNR2KDM4EKMT2AL3MBTL1
Trifluoromethanesulfonic Acid SCHEMBL3365764 0.89 CNR1 (0.32) CNR1CNR2KDM4EL3MBTL1SLC2A1
SCHEMBL6398679 0.87 KDM4E (0.34) CNR1CNR2KDM4EKMT2AL3MBTL1
SCHEMBL6394293 0.85 KDM4E (0.37) CNR1CNR2KDM4EKMT2AL3MBTL1
SCHEMBL6399777 0.85 KDM4E (0.34) CNR1CNR2KDM4EKMT2AL3MBTL1
SCHEMBL3368083 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
US-6964840-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-15 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed
US-6800414-B2 FLUOROPOLYMER JSR CORPORATION (JP) 2004-10-05 US disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed