Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | PPARG | P37231 | 1/20 | 0.32 |
| ▸ | NCOA2 | Q15596 | 1/20 | 0.32 |
| ▸ | NCOA1 | Q15788 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.32 |
| ▸ | NCOA3 | Q9Y6Q9 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.31 |
| ▸ | ESR1 | P03372 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11274317 | 0.83 | LMNA (0.41) | LMNAMAPTTSHRALDH1A1HTT | |
| SCHEMBL6381118 | 0.81 | MMP1 (0.33) | MAPT | |
| SCHEMBL3367780 | 0.81 | EPHX2 (0.35) | MAPT | |
| SCHEMBL11115364 | 0.75 | LMNA (0.46) | LMNAMAPTTSHRCYP2D6ALDH1A1 | |
| SCHEMBL3364155 | 0.74 | TSHR (0.44) | MAPTTSHRALDH1A1PPARGNCOA2 | |
| SCHEMBL28763239 | 0.74 | LMNA (0.56) | LMNAMAPTTSHRALDH1A1 | |
| SCHEMBL1311829 | 0.73 | LMNA (0.45) | LMNAMAPTTSHRCYP2D6ALDH1A1 | |
| SCHEMBL838391 | 0.73 | — | — | |
| SCHEMBL271918 | 0.73 | — | — | |
| SCHEMBL11908657 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| CN-110709774-B | Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2023-12-08 | — | — | CN | disclosed |
| WO-2023210623-A1 | HALOALKYL SULFONE ANILIDE COMPOUND AND HERBICIDE CONTAINING SAME | 株式会社エス・ディー・エス バイオテック | 2023-11-02 | — | — | WO | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| US-20200264511-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-08-20 | — | — | US | disclosed |
| EP-3693793-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT | Mitsui Chemicals, Inc. (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-20200241419-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-07-30 | — | — | US | disclosed |
| CN-111183395-A | Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-05-19 | — | — | CN | disclosed |
| CN-110709774-A | Material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-01-17 | — | — | CN | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-0822544-B1 | Optical recording medium | MITSUI CHEMICALS INC (JP) | 2001-01-03 | — | — | EP | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| US-6060606-A | OPTICAL RECORDING MEDIUM HAVING AT LEAST A RECORDING LAYER AND A REFLECTIVE LAYER ON A SUBSTRATES; HIGH DENSITY, COMPACT DISKS | MITSUI CHEMICALS, INC. (JP) | 2000-05-09 | — | — | US | disclosed |
| US-5948593-A | CONTAINING A PIPYRROMETHENE METAL CHELATE COMPOUND | MITSUI CHEMICALS, INC. (JP) | 1999-09-07 | — | — | US | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0822544-A1 | Optical recording medium | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1998-02-04 | — | — | EP | disclosed |