⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4499231 | 0.77 | MEN1 (0.35) | — | |
| SCHEMBL3367780 | 0.76 | EPHX2 (0.35) | — | |
| SCHEMBL11908661 | 0.75 | — | — | |
| SCHEMBL9420707 | 0.73 | TSHR (0.39) | — | |
| SCHEMBL2254573 | 0.73 | ALDH1A1 (0.44) | — | |
| SCHEMBL6380955 | 0.73 | SMN1; SMN2 (0.33) | — | |
| SCHEMBL3364026 | 0.72 | LMNA (0.41) | — | |
| SCHEMBL1471664 | 0.72 | ALDH1A1 (0.38) | — | |
| SCHEMBL11907824 | 0.71 | THRB (0.31) | — | |
| SCHEMBL15135938 | 0.70 | THRB (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| US-20200264511-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-08-20 | — | — | US | disclosed |
| EP-3693793-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT | Mitsui Chemicals, Inc. (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-20200241419-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-07-30 | — | — | US | disclosed |
| CN-111183395-A | Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-05-19 | — | — | CN | disclosed |
| CN-110709774-A | Material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-01-17 | — | — | CN | disclosed |
| US-8450440-B2 | Method for purifying polymer and polymer | MITSUI CHEMICALS, INC. (JP) | 2013-05-28 | — | — | US | disclosed |
| US-20120208976-A1 | METHOD FOR PURIFYING POLYMER AND POLYMER | MITSUI CHEMICALS, INC (JP) | 2012-08-16 | — | — | US | disclosed |