Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 5/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL2745921 | 0.91 | ACHE (0.31) | ACHE | |
| SCHEMBL6391372 | 0.91 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL3364019 | 0.90 | ALDH1A1 (0.30) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL3366125 | 0.90 | HPGD (0.32) | ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL6845188 | 0.88 | ACHE (0.32) | ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL3364319 | 0.86 | KCNH2 (0.35) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL3363923 | 0.86 | NPC1 (0.31) | — | |
| SCHEMBL6399812 | 0.84 | KDM4E (0.33) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL2745535 | 0.83 | HTR7 (0.31) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6838193 | 0.83 | HCRTR1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-6964840-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-15 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| US-6800414-B2 | FLUOROPOLYMER | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-6403280-B1 | TERPOLYMER COMPRISING MALEIC ANHYDRIDE, NORBORNENE ESTER DERIVATIVE, AND ALICYCLIC (METH)ACRYLATE MONOMERS; DURABILITY TO DRY ETCHING; TRANSPARENCY, STORAGE STABILITY | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |