SCHEMBL336594

SCHEMBL336594

CC(C)(c1ccc(O)c(N)c1)c1ccc(O)c(N)c1

nearest known ligand 0.76

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.76
GAA P10253 6/20 0.76
MAPT P10636 4/20 0.76
MEN1 O00255 3/20 0.76
KMT2A Q03164 3/20 0.76
RECQL P46063 2/20 0.76
PKM P14618 2/20 0.76
ESR1 P03372 4/20 0.61
CHEK1 O14757 1/20 0.54
FYN P06241 1/20 0.54
PDGFRB P09619 1/20 0.54
PIM1 P11309 1/20 0.54
FGFR1 P11362 1/20 0.54
FLT1 P17948 1/20 0.54
GRK5 P34947 1/20 0.54
MAP2K2 P36507 1/20 0.54
MAPK8 P45983 1/20 0.54
CDK8 P49336 1/20 0.54
RPS6KA3 P51812 1/20 0.54
PRKX P51817 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29412585 1.00 ALDH1A1 (0.76) ALDH1A1GAAMAPTMEN1KMT2A
SCHEMBL29555588 1.00 ALDH1A1 (0.76) ALDH1A1GAAMAPTMEN1KMT2A
Hydrochloric Acid SCHEMBL30172192 0.98 ALDH1A1 (0.73) ALDH1A1GAAMAPTMEN1KMT2A
SCHEMBL17028798 0.98 ALDH1A1 (0.73) ALDH1A1GAAMAPTMEN1KMT2A
SCHEMBL36206771 0.92 ALDH1A1 (0.66) ALDH1A1GAAMAPTMEN1KMT2A
SCHEMBL17038648 0.92 ALDH1A1 (0.66) ALDH1A1GAAMAPTMEN1KMT2A
SCHEMBL16848516 0.92 ESR1 (0.77) ALDH1A1GAAMAPTMEN1KMT2A
SCHEMBL565140 0.92 ALDH1A1 (0.66) ALDH1A1GAAMAPTMEN1KMT2A
SCHEMBL563910 0.92 ALDH1A1 (0.66) ALDH1A1GAAMAPTMEN1KMT2A
SCHEMBL8515161 0.92 ALDH1A1 (0.66) ALDH1A1GAAMAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1290 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12619005-B2 Optical film with improved optical properties, display apparatus comprising same, and manufacturing method therefor KOLON INDUSTRIES, INC. (KR) 2026-05-05 US claimed
EP-4628461-A1 POLY(AMIC ACID) SLURRY FOR OPTICAL FIBERS, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF Ningbo Boya Poly Advanced Materials Co., Ltd. (CN) 2025-10-08 EP claimed
EP-4553101-B1 A POLYMIDE VARNISH AND PREPARATION METHOD AND USE THEREOF NINGBO BOYA POLY ADVANCED MAT CO LTD (CN) 2025-10-08 EP claimed
EP-4553101-A1 A POLYMIDE VARNISH AND PREPARATION METHOD AND USE THEREOF Ningbo Boya Poly Advanced Materials Co., Ltd. (CN) 2025-05-14 EP claimed
US-20250130495-A1 POLYBENZOXAZOL PRECURSOR OR POLYIMIDE PRECURSOR OR THE COPOLYMER THEREOF, AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION THEREFROM DUK SAN NEOLUX CO., LTD. (KR) 2025-04-24 US claimed
US-20250109251-A1 OPTICAL FILM AND METHOD OF PREPARING SAME KOLON INDUSTRIES, INC. (KR) 2025-04-03 US claimed
WO-2024216910-A1 HIGH-CHEMICAL-RESISTANCE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF 明士(北京)新材料开发有限公司 2024-10-24 WO claimed
US-20240336599-A1 PHOTOSENSITIVE POLYAMIC ACID AND DIAZIRINE COMPOSITIONS PROMERUS, LLC (US) 2024-10-10 US claimed
US-20240336738-A1 RESIN COMPOSITION, POLYIMIDE PREPARATION METHOD AND RELATED PRODUCTS AAC TECHNOLOGIES (NANJING) CO., LTD. (CN) 2024-10-10 US claimed
WO-2024207567-A1 RESIN COMPOSITION, POLYIMIDE PREPARATION METHOD, AND RELATED PRODUCT 瑞声科技(南京)有限公司 2024-10-10 WO claimed
US-20040229166-A1 Novel photosensitive resin compositions ARCH SPECIALTY CHEMICALS, INC. 2004-11-18 US claimed
WO-2004081664-A2 NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS ARCH SPECIALTY CHEMICALS, INC. (US) 2004-09-23 WO claimed
WO-2004081663-A2 NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS ARCH SPECIALTY CHEMICALS, INC. (US) 2004-09-23 WO claimed
WO-2004081057-A2 NOVEL PHOTOSENSITIVE RESIN COMPOSITIONS ARCH SPECIALTY CHEMICALS, INC. (US) 2004-09-23 WO claimed
EP-1455007-A2 Method for depositing and patterning carbon nanotubes using chemical self-assembly process SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-09-08 EP claimed
US-20040142285-A1 Method for laminating and patterning carbon nanotubes using chemical self-assembly process SAMSUNG ELECTRONICS CO., LTD. 2004-07-22 US claimed
EP-0733665-B1 Process for the preparation of polybenzoxazol precursors and their corresponding resist solutions SIEMENS AG (DE) 1998-07-29 EP claimed
US-5688631-A Methods for producing polybenzoxazol precursors and corresponding resist solutions SIEMENS AKTIENGESELLSCHAFT (DE) 1997-11-18 US claimed
EP-0733665-A1 Process for the preparation of polybenzoxazol precursors and their corresponding resist solutions SIEMENS AKTIENGESELLSCHAFT (DE) 1996-09-25 EP claimed
US-4927736-A Hydroxy polyimides and high temperature positive photoresists therefrom HOECHST CELANESE CORPORATION (US) 1990-05-22 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240336599-A1 PHOTOSENSITIVE POLYAMIC ACID AND DIAZIRINE COMPOSITIONS PUF60, FTO, PARN ALDH1A1 2713/4885GAA 1904/4885MAPT 1775/4885
US-12619005-B2 Optical film with improved optical properties, display apparatus comprising same, and manufacturing method therefor SETDB1, TRAFD1, RFC5 ALDH1A1 2605/4885GAA 1021/4885MAPT 1776/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.