SCHEMBL3365992

SCHEMBL3365992

CCCCCCCCS(=O)(=O)[O-].CCOC(=O)OC1CC[S+](c2cccc3ccccc23)C1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.35
HPGD P15428 1/20 0.35
KDM4E B2RXH2 4/20 0.33
RXFP1 Q9HBX9 1/20 0.33
KMT2A Q03164 2/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
NR1D1 P20393 1/20 0.32
APOBEC3A P31941 1/20 0.32
APOBEC3G Q9HC16 1/20 0.32
PKM P14618 1/20 0.32
CNR1 P21554 3/20 0.32
CNR2 P34972 3/20 0.32
POLB P06746 1/20 0.32
CDC25B P30305 2/20 0.31
CDC25A P30304 1/20 0.31
CDC25C P30307 1/20 0.31
CCR8 P51685 1/20 0.31
HSD17B10 Q99714 1/20 0.30
MAPT P10636 1/20 0.30
CASP3 P42574 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3362985 0.94 CNR1 (0.33) ALDH1A1HPGDKDM4ERXFP1KMT2A
SCHEMBL3367546 0.94 CNR1 (0.33) ALDH1A1HPGDKDM4ERXFP1KMT2A
SCHEMBL3365940 0.92 KDM4E (0.37) ALDH1A1HPGDKDM4ERXFP1KMT2A
SCHEMBL3367541 0.90 KDM4E (0.32) ALDH1A1KDM4ERXFP1KMT2AL3MBTL1
SCHEMBL3364441 0.90 KDM4E (0.37) ALDH1A1KDM4ERXFP1KMT2AL3MBTL1
SCHEMBL6399777 0.87 KDM4E (0.34) ALDH1A1HPGDKDM4ERXFP1KMT2A
SCHEMBL6566380 0.87 ALDH1A1 (0.45) ALDH1A1HPGDKDM4EKMT2AL3MBTL1
SCHEMBL6394293 0.86 KDM4E (0.37) ALDH1A1HPGDKDM4ERXFP1KMT2A
Trifluoromethanesulfonic Acid SCHEMBL2745117 0.85 ALDH1A1 (0.38) ALDH1A1HPGDKDM4EKMT2ANR1D1
SCHEMBL6398679 0.84 KDM4E (0.34) ALDH1A1HPGDKDM4ERXFP1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
US-6964840-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-15 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed
US-6800414-B2 FLUOROPOLYMER JSR CORPORATION (JP) 2004-10-05 US disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed