SCHEMBL3367541

SCHEMBL3367541

CC(C)(C)OC(=O)OC1CC[S+](c2cccc3ccccc23)C1.CCCCCCCCS(=O)(=O)[O-]

nearest known ligand 0.32

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.32
KMT2A Q03164 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
CNR1 P21554 1/20 0.31
CNR2 P34972 1/20 0.31
ALDH1A1 P00352 1/20 0.31
RXFP1 Q9HBX9 1/20 0.31
PSEN1 P49768 1/20 0.30
PSEN2 P49810 1/20 0.30
APH1B Q8WW43 1/20 0.30
NCSTN Q92542 1/20 0.30
APH1A Q96BI3 1/20 0.30
PSENEN Q9NZ42 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3365940 0.91 KDM4E (0.37) KDM4EKMT2AL3MBTL1CNR1CNR2
SCHEMBL3365992 0.90 ALDH1A1 (0.35) KDM4EKMT2AL3MBTL1CNR1CNR2
SCHEMBL3362985 0.89 CNR1 (0.33) KDM4EKMT2AL3MBTL1CNR1CNR2
SCHEMBL3367546 0.89 CNR1 (0.33) KDM4EKMT2AL3MBTL1CNR1CNR2
SCHEMBL3364441 0.88 KDM4E (0.37) KDM4EKMT2AL3MBTL1CNR1CNR2
Trifluoromethanesulfonic Acid SCHEMBL2745482 0.85 MEN1 (0.32) KMT2A
SCHEMBL6394293 0.85 KDM4E (0.37) KDM4EKMT2AL3MBTL1CNR1CNR2
SCHEMBL6399777 0.84 KDM4E (0.34) KDM4EKMT2AL3MBTL1CNR1CNR2
SCHEMBL6398679 0.83 KDM4E (0.34) KDM4EKMT2AL3MBTL1CNR1CNR2
SCHEMBL6399812 0.81 KDM4E (0.33) KDM4EKMT2AL3MBTL1ALDH1A1RXFP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
US-6964840-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-15 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed
US-6800414-B2 FLUOROPOLYMER JSR CORPORATION (JP) 2004-10-05 US disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed