SCHEMBL3366580

SCHEMBL3366580

CC(=O)OC(CC1CC2C=CC1C2)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 9/20 0.34
ALDH1A1 P00352 4/20 0.33
POLB P06746 1/20 0.32
ALOX15 P16050 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CETP P11597 1/20 0.31
PKM P14618 2/20 0.31
MAPT P10636 1/20 0.31
MAPK1 P28482 1/20 0.31
LMNA P02545 1/20 0.30
MEN1 O00255 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP3A4 P08684 1/20 0.30
CYP2D6 P10635 1/20 0.30
CYP2C19 P33261 1/20 0.30
KMT2A Q03164 1/20 0.30
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3365879 0.84 KDM4E (0.32) KDM4EALDH1A1POLBALOX15
SCHEMBL3363553 0.81 KDM4E (0.41) KDM4EALDH1A1POLBALOX15MEN1
SCHEMBL14761258 0.74 KDM4E (0.34) KDM4EALDH1A1POLBALOX15TDP1
SCHEMBL3365813 0.72 ALDH1A1 (0.34) KDM4EALDH1A1LMNA
SCHEMBL12634093 0.72 KDM4E (0.36) KDM4EALDH1A1POLBALOX15TDP1
SCHEMBL32688903 0.72 KDM4E (0.40) KDM4EALDH1A1POLBALOX15TDP1
SCHEMBL3364065 0.72 KDM4E (0.37) KDM4EALDH1A1TDP1CETPPKM
SCHEMBL13532352 0.72 KDM4E (0.40) KDM4EALDH1A1MEN1CYP1A2CYP3A4
SCHEMBL24355085 0.72 KDM4E (0.39) KDM4EALDH1A1TDP1MEN1CYP1A2
SCHEMBL6836071 0.71 KDM4E (0.32) KDM4EALDH1A1POLBALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-6964840-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-15 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed
US-6800414-B2 FLUOROPOLYMER JSR CORPORATION (JP) 2004-10-05 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed