SCHEMBL3363553

SCHEMBL3363553

COC(CC1CC2C=CC1C2)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 8/20 0.41
ALDH1A1 P00352 2/20 0.41
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C19 P33261 1/20 0.35
ATM Q13315 1/20 0.35
HTT P42858 1/20 0.34
TSHR P16473 1/20 0.33
POLB P06746 1/20 0.33
ALOX15 P16050 1/20 0.33
IDO1 P14902 1/20 0.32
TDO2 P48775 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3366580 0.81 KDM4E (0.34) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL13532352 0.78 KDM4E (0.40) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL24355085 0.78 KDM4E (0.39) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL3365879 0.77 KDM4E (0.32) KDM4EALDH1A1POLBALOX15
SCHEMBL257634 0.76 KDM4E (0.41) KDM4EALDH1A1MEN1KMT2AHTT
SCHEMBL3364065 0.75 KDM4E (0.37) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL465320 0.73 KDM4E (0.47) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL12256142 0.71 KDM4E (0.42) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL19689430 0.70 KDM4E (0.44) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL15467439 0.70 KDM4E (0.36) KDM4EALDH1A1MEN1KMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-6964840-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-15 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed
US-6800414-B2 FLUOROPOLYMER JSR CORPORATION (JP) 2004-10-05 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed