Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.39 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.38 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | APEX1 | P27695 | 1/20 | 0.36 |
| ▸ | RECQL | P46063 | 1/20 | 0.36 |
| ▸ | BLM | P54132 | 1/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3365931 | 0.82 | LMNA (0.47) | MAPTKDM4ELMNAALDH1A1HPGD | |
| SCHEMBL13888469 | 0.81 | KDM4E (0.44) | KDM4ELMNAALDH1A1HPGDRAB9A | |
| SCHEMBL28630522 | 0.80 | LMNA (0.46) | MAPTKDM4ELMNAALDH1A1HPGD | |
| SCHEMBL20375290 | 0.80 | LMNA (0.46) | MAPTKDM4ELMNAALDH1A1HPGD | |
| SCHEMBL947840 | 0.80 | LMNA (0.46) | MAPTKDM4ELMNAALDH1A1HPGD | |
| SCHEMBL11908671 | 0.80 | LMNA (0.46) | MAPTKDM4ELMNAALDH1A1HPGD | |
| SCHEMBL3367480 | 0.79 | MAPT (0.46) | MAPTKDM4ELMNACYP19A1APOBEC3A | |
| SCHEMBL22263842 | 0.79 | KDM4E (0.37) | KDM4ELMNAALDH1A1HPGDRAB9A | |
| SCHEMBL12228727 | 0.79 | NAAA (0.41) | MAPTKDM4ELMNAALDH1A1HPGD | |
| SCHEMBL2135609 | 0.78 | KDM4E (0.44) | KDM4ELMNAALDH1A1HPGDRAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8609574-B2 | In situ olefin polymerization catalyst system | PROMERUS LLC (US) | 2013-12-17 | — | — | US | disclosed |
| EP-2296811-A2 | IN SITU OLEFIN POLYMERIZATION CATALYST SYSTEM | Promerus, LLC (US) | 2011-03-23 | — | — | EP | disclosed |
| US-7910674-B2 | Especially a copolymer of norbornene and/or alkylnorbornene and (trialkoxysilylalkyl)norbornene; optical articles such as ophthalmic lenses, wave guides, optical fibers, and optical adhesives | PROMERUS, LLC (US) | 2011-03-22 | — | — | US | disclosed |
| US-7875686-B2 | comprising 10 to 99 wt. % of norbornene-type cycloolefin monomers; for microelectronic, optoelectronic and micro-optoelectronic applications such as die attach adhesives, underfill materials, prepreg binders, encapsulants | PROMERUS LLC (US) | 2011-01-25 | — | — | US | disclosed |
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| EP-1270553-B1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORP (JP) | 2009-11-18 | — | — | EP | disclosed |
| US-20090270247-A1 | IN SITU OLEFIN POLYMERIZATION CATALYST SYSTEM | PROMERUS LLC (US) | 2009-10-29 | — | — | US | disclosed |
| WO-2009132240-A2 | IN SITU OLEFIN POLYMERIZATION CATALYST SYSTEM | PROMERUS LLC (US) | 2009-10-29 | — | — | WO | disclosed |
| EP-1791888-B1 | POLYCYCLOOLEFIN POLYMERIC COMPOSITIONS FOR SEMICONDUCTOR APPLICATIONS | PROMERUS LLC (US) | 2009-03-25 | — | — | EP | disclosed |
| US-7314701-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-01-01 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-1034196-A1 | CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS | THE B.F. GOODRICH COMPANY (US) | 2000-09-13 | — | — | EP | disclosed |
| WO-2000020472-A1 | CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS | THE B.F. GOODRICH COMPANY (US) | 2000-04-13 | — | — | WO | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| EP-0409291-B1 | Thermoplastic resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-02-14 | — | — | EP | disclosed |
| EP-0317262-B1 | Transparent resin material | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-01-31 | — | — | EP | disclosed |
| US-5053471-A | Methathesis ring opening polymerization of polar substituted norbornenes or octahydromethanonphthalenes; optics | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-10-01 | — | — | US | disclosed |
| EP-0409291-A2 | Thermoplastic resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-01-23 | — | — | EP | disclosed |