SCHEMBL337246

SCHEMBL337246

COC1(OC)C=CC(C(=O)c2ccccc2O)C(O)=C1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.41
TSHR P16473 2/20 0.41
HPGD P15428 5/20 0.38
CYP2C19 P33261 3/20 0.38
CYP1A2 P05177 2/20 0.38
CYP3A4 P08684 2/20 0.38
ALOX15 P16050 2/20 0.38
AR P10275 2/20 0.38
PGR P06401 1/20 0.38
ADORA3 P0DMS8 1/20 0.38
CHRM1 P11229 1/20 0.38
TBXA2R P21731 1/20 0.38
SLC6A2 P23975 1/20 0.38
ADRA1A P35348 1/20 0.38
HIF1A Q16665 1/20 0.38
ALDH1A1 P00352 5/20 0.36
CYP2C9 P11712 2/20 0.36
KDM4E B2RXH2 3/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
CA12 O43570 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8520514 0.86 PIN1 (0.40) LMNACHRM1ALDH1A1SMN1; SMN2CA12
SCHEMBL11045870 0.86 TSHR (0.36) LMNATSHRHPGDCYP2C19CYP1A2
SCHEMBL6658452 0.85 LMNA (0.41) LMNATSHRHPGDCYP2C19CYP1A2
SCHEMBL3120601 0.83 TSHR (0.36) LMNATSHRHPGDCYP2C19CYP1A2
SCHEMBL10632334 0.81 TSHR (0.39) LMNATSHRHPGDCYP2C19CYP1A2
SCHEMBL424984 0.80 KDM4E (0.39) LMNATSHRHPGDCYP2C19CYP1A2
SCHEMBL11075480 0.79 TSHR (0.36) LMNATSHRHPGDCYP2C19CYP1A2
SCHEMBL9338227 0.78 ALDH1A1 (0.41) LMNATSHRHPGDCYP2C19CYP1A2
SCHEMBL10888869 0.72 MEN1 (0.39) TSHRALDH1A1KDM4ESMN1; SMN2KMT2A
SCHEMBL3891165 0.69 LMNA (0.36) LMNATSHRHPGDCYP2C19CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 175 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2019110264-A1 COMPOSITION FOR THE MANUFACTURE OF AN OPHTALMIC LENS COMPRISING AN ENCAPSULATED LIGHT-ABSORBING ADDITIVE ESSILOR INTERNATIONAL (FR) 2019-06-13 WO claimed
US-8097048-B2 Photostability; overcoating with liquid; controlling temperature TORAY INDUSTRIES, INC. (JP) 2012-01-17 US claimed
US-6814959-B1 SOLID AGENTS, COMPRISING POLYMORPHIC LIPID PARTICLES, WITH UV RADIATION-ABSORBING AND/OR REFLECTING ACTION FOR APPLICATION ON THE SKIN, MUCOUS MEMBRANES, SCALP AND HAIR FOR PROTECTION AGAINST HEALTH-DAMAGING UV RADIATION PHARMASOL GMBH (DE) 2004-11-09 US claimed
US-6540795-B2 Stabilized against discoloration and fading CIBA SPECIALTY CHEMICALS CORPORATION 2003-04-01 US claimed
US-4921942-A Organometallic compounds STEPAN COMPANY (US) 1990-05-01 US claimed
US-4169005-A LAMINATING ADHESIVE, PLASTIC FILM, CURING THE TOP COAT CHAMPION INTERNATIONAL CORPORATION (US) 1979-09-25 US claimed
US-20250361426-A1 METHOD FOR PRODUCING PRESSURE-SENSITIVE ADHESIVE SHEET, AND PRESSURE-SENSITIVE ADHESIVE SHEET NITTO DENKO CORPORATION (JP) 2025-11-27 US disclosed
US-12398296-B2 Method for producing pressure-sensitive adhesive sheet, and pressure-sensitive adhesive sheet NITTO DENKO CORPORATION (JP) 2025-08-26 US disclosed
WO-2025069656-A1 LAMINATE AND DISPLAY DEVICE コニカミノルタ株式会社 2025-04-03 WO disclosed
US-11898057-B2 Weather-resistant hard coat composition for glass-substitute substrate, cured product, and laminate DAICEL CORPORATION (JP) 2024-02-13 US disclosed
US-11866608-B2 Weather-resistant hard coat composition for metal, cured product, and coated metal substrate DAICEL CORPORATION (JP) 2024-01-09 US disclosed
WO-2023243636-A1 MEMBER PROCESSING METHOD 日東電工株式会社 2023-12-21 WO disclosed
WO-2023243634-A1 TRANSFER SHEET 日東電工株式会社 2023-12-21 WO disclosed
EP-0331087-A2 Ultraviolet-curing coating composition and production process of molded plastic article having hardened coating of modified surface characteristics MITSUBISHI RAYON CO., LTD. (JP) 1989-09-06 EP disclosed
EP-0325440-A2 Method and apparatus for the manufacture of three-layered containers KAMAYA KAGAKU KOGYO CO., LTD. (JP) 1989-07-26 EP disclosed
EP-0292554-A4 MOISTURE-RESISTANT SKIN TREATMENT COMPOSITIONS. RITZ GROUP LTD CHARLES (US) 1989-02-22 EP disclosed
EP-0292554-A1 MOISTURE-RESISTANT SKIN TREATMENT COMPOSITIONS CHARLES OF THE RITZ GROUP LTD. (US) 1988-11-30 EP disclosed
WO-1988004167-A1 MOISTURE-RESISTANT SKIN TREATMENT COMPOSITIONS CHARLES OF THE RITZ GROUP LTD. (US) 1988-06-16 WO disclosed
US-4131463-A Electric recording process of images using electron sensitive layer containing trivalent cobalt complex and compound having conjugated π bond system FUJI PHOTO FILM CO., LTD. (JP) 1978-12-26 US disclosed
US-4018941-A Process for coating polymeric substrates with mar-resistant coating AMERICAN CYANAMID COMPANY (US) 1977-04-19 US disclosed