SCHEMBL3376993

SCHEMBL3376993

C=C(C)C(=O)OCC(CO)(CO)C(C)OCC

nearest known ligand 0.43

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.43
THRB P10828 1/20 0.41
ALDH1A1 P00352 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2989767 0.92 TSHR (0.47) TSHRTHRBALDH1A1
SCHEMBL4910096 0.88 TSHR (0.41) TSHRTHRBALDH1A1
SCHEMBL7647367 0.81 TSHR (0.43) TSHRTHRBALDH1A1
SCHEMBL9705820 0.81 TSHR (0.46) TSHRTHRBALDH1A1
Methacrylic Acid SCHEMBL2989771 0.80 TSHR (0.32) TSHRTHRBALDH1A1
SCHEMBL49067 0.80 TSHR (0.48) TSHRTHRBALDH1A1
SCHEMBL16149527 0.77 TSHR (0.42) TSHRTHRBALDH1A1
SCHEMBL35547 0.76 TSHR (0.52) TSHRTHRBALDH1A1
Acetic Acid SCHEMBL29779174 0.76 ALDH1A1 (0.36) ALDH1A1
SCHEMBL8850794 0.75 TSHR (0.50) TSHRTHRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3369757-B1 LINEAR POLYESTER RESINS AND PROCESS FOR PREPARATION OF THE POLYESTERS SUN CHEMICAL CORP (US) 2020-09-30 EP disclosed
US-9150742-B2 Linear polyester resins and improved lithographic inks SUN CHEMICAL CORPORATION (US) 2015-10-06 US disclosed
US-8807731-B2 Inkjet image forming apparatus and inkjet image forming method RICOH COMPANY, LTD. (JP) 2014-08-19 US disclosed
US-20140228471-A1 LINEAR POLYESTER RESINS AND IMPROVED LITHOGRAPHIC INKS SUN CHEMICAL CORPORATION (US) 2014-08-14 US disclosed
US-20110298876-A1 INKJET IMAGE FORMING APPARATUS AND INKJET IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2011-12-08 US disclosed
US-20100159691-A1 PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE ASAHI KASEI EMD CORPORATION (JP) 2010-06-24 US disclosed
US-20080233305-A1 Method for manufacturing coating film TOPPAN PRINTING CO., LTD. (JP) 2008-09-25 US disclosed