Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11465051 | 0.80 | TSHR (0.35) | TSHR | |
| SCHEMBL181414 | 0.80 | PRMT3 (0.33) | — | |
| SCHEMBL28074882 | 0.78 | TDP1 (0.39) | — | |
| SCHEMBL11461215 | 0.77 | FDPS (0.34) | TSHR | |
| SCHEMBL21623634 | 0.74 | — | — | |
| SCHEMBL11465914 | 0.73 | MMP1 (0.31) | — | |
| SCHEMBL2330323 | 0.73 | TSHR (0.39) | TSHR | |
| SCHEMBL18553317 | 0.72 | LMNA (0.31) | — | |
| SCHEMBL11456009 | 0.72 | — | — | |
| SCHEMBL4786657 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11571710-B2 | Coating method and coating film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-02-07 | — | — | US | disclosed |
| EP-3738682-A1 | COATING METHOD AND COATING FILM | Asahi Kasei Kabushiki Kaisha (JP) | 2020-11-18 | — | — | EP | disclosed |
| US-20200339833-A1 | COATING METHOD AND COATING FILM | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-10-29 | — | — | US | disclosed |
| WO-2013158127-A1 | AGENTS FOR IMPROVED DELIVERY OF NUCLEIC ACIDS TO EUKARYOTIC CELLS | MOLECULAR TRANSFER, INC. (US) | 2013-10-24 | — | — | WO | disclosed |
| EP-1381656-B1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECH MATERIALS (US) | 2010-11-10 | — | — | EP | disclosed |
| EP-1381656-A4 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECH MATERIALS (US) | 2007-06-13 | — | — | EP | disclosed |
| EP-1381656-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2004-01-21 | — | — | EP | disclosed |
| WO-2002077120-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2002-10-03 | — | — | WO | disclosed |
| WO-1998030667-A1 | SEMICONDUCTOR WAFER CLEANING COMPOSITION AND METHOD WITH AQUEOUS AMMONIUM FLUORIDE AND AMINE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 1998-07-16 | — | — | WO | disclosed |
| US-5096982-A | Rubber-based molding materials | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-03-17 | — | — | US | disclosed |
| US-4223138-A | VAPORIZATION, CONDENSATION, RETARDING FLOW TO REACTION ZONE | BAYER AKTIENGESELLSCHAFT (DE) | 1980-09-16 | — | — | US | disclosed |