Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL340451 | 0.83 | THRB (0.36) | THRBLMNA | |
| SCHEMBL25722 | 0.81 | THRB (0.44) | THRBLMNA | |
| SCHEMBL6703625 | 0.81 | THRB (0.35) | THRBLMNA | |
| SCHEMBL5666168 | 0.81 | THRB (0.50) | THRBLMNA | |
| Ammonia Solution, Strong SCHEMBL1425644 | 0.79 | THRB (0.42) | THRBLMNA | |
| SCHEMBL4156085 | 0.78 | — | — | |
| SCHEMBL6227646 | 0.75 | THRB (0.44) | THRBLMNA | |
| SCHEMBL7753817 | 0.75 | THRB (0.44) | THRBLMNA | |
| SCHEMBL340887 | 0.75 | — | — | |
| SCHEMBL8462439 | 0.74 | ADRB2 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220213129-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2022-07-07 | — | — | US | claimed |
| CN-113785085-A | Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film | 东曹株式会社 | 2021-12-10 | — | — | CN | claimed |
| WO-2020209202-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR MANUFACTURING SILICON OXIDE FILM | 東ソー株式会社 | 2020-10-15 | — | — | WO | claimed |
| US-20220213129-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2022-07-07 | — | — | US | disclosed |
| CN-113785085-A | Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film | 东曹株式会社 | 2021-12-10 | — | — | CN | disclosed |
| WO-2020209202-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR MANUFACTURING SILICON OXIDE FILM | 東ソー株式会社 | 2020-10-15 | — | — | WO | disclosed |
| US-8377626-B2 | Methods of forming a pattern using negative-type photoresist compositions | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-02-19 | — | — | US | disclosed |
| EP-2065455-B1 | Pressure-sensitive adhesive tape | NITTO DENKO CORP (JP) | 2012-05-16 | — | — | EP | disclosed |
| US-20120015100-A1 | Pressure-Sensitive Adhesive Tape | NITTO DENKO CORPORATION (JP) | 2012-01-19 | — | — | US | disclosed |
| EP-2383321-A2 | Process for producing an adhesive composition and adhesive tape comprising an adhesive composition produced by said process | Nitto Denko Corporation (JP) | 2011-11-02 | — | — | EP | disclosed |
| US-20100248134-A1 | Methods of forming a pattern using negative-type photoresist compositions | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-09-30 | — | — | US | disclosed |
| US-20090142593-A1 | PRESSURE-SENSITIVE ADHESIVE TAPE | NITTO DENKO CORPORATION (JP) | 2009-06-04 | — | — | US | disclosed |
| EP-2065455-A1 | Pressure-sensitive adhesive tape | NITTO DENKO CORPORATION (JP) | 2009-06-03 | — | — | EP | disclosed |
| EP-0604677-B1 | Method of making coated shaped articles | MITSUBISHI RAYON CO (JP) | 1999-08-11 | — | — | EP | disclosed |
| US-5470616-A | Coated shaped articles and method of making same | MITSUBISHI RAYON CO., LTD. (JP) | 1995-11-28 | — | — | US | disclosed |
| EP-0604677-A1 | Coated shaped articles and method of making same | MITSUBISHI RAYON CO., LTD. (JP) | 1994-07-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220213129-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM | VSIR, SMURF2, SMURF1 | THRB 2657/4885LMNA 3773/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.