SCHEMBL3391564

SCHEMBL3391564

O=C(O)c1cc2c(O)cccc2cc1O

nearest known ligand 0.86

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 1/20 0.86
GRIN2A Q12879 1/20 0.86
GRIN2B Q13224 1/20 0.86
GRIN2C Q14957 1/20 0.86
ACMSD Q8TDX5 3/20 0.49
MCL1 Q07820 1/20 0.49
MAOA P21397 1/20 0.49
PTPN1 P18031 1/20 0.49
KDM4E B2RXH2 4/20 0.48
CASP7 P55210 3/20 0.48
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
POLB P06746 2/20 0.48
CASP1 P29466 2/20 0.48
USP2 O75604 1/20 0.48
HSD17B10 Q99714 1/20 0.48
NR4A1 P22736 1/20 0.47
NR4A2 P43354 1/20 0.47
NR4A3 Q92570 1/20 0.47
ALDH1A1 P00352 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29620342 0.92 GRIN2D (1.00) GRIN2DGRIN2AGRIN2BGRIN2CACMSD
SCHEMBL214909 0.92 GRIN2D (1.00) GRIN2DGRIN2AGRIN2BGRIN2CACMSD
SCHEMBL10353592 0.90 GRIN2D (0.82) GRIN2DGRIN2AGRIN2BGRIN2CACMSD
SCHEMBL10824259 0.85 GRIN2D (0.73) GRIN2DGRIN2AGRIN2BGRIN2CACMSD
SCHEMBL24895086 0.84 GRIN2D (0.62) GRIN2DGRIN2AGRIN2BGRIN2CACMSD
SCHEMBL10796264 0.84 GRIN2D (0.67) GRIN2DGRIN2AGRIN2BGRIN2CACMSD
SCHEMBL22721607 0.84 GRIN2D (0.62) GRIN2DGRIN2AGRIN2BGRIN2CACMSD
SCHEMBL24895089 0.80 GRIN2D (0.57) GRIN2DGRIN2AGRIN2BGRIN2CACMSD
SCHEMBL29358330 0.79 GRIN2D (0.66) GRIN2DGRIN2AGRIN2BGRIN2CACMSD
SCHEMBL6460 0.79 GRIN2D (0.66) GRIN2DGRIN2AGRIN2BGRIN2CACMSD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11693313-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-04 US disclosed
US-11693313-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-04 US disclosed
WO-2023287067-A1 ANTIBACTERIAL COMPOUND 주식회사 엘지화학 2023-01-19 WO disclosed
US-20220179313-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2022-06-09 US disclosed
US-20220121118-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2022-04-21 US disclosed
EP-3230339-B1 EPOXY RESIN COMPOSITION, PREPREG, FIBER-REINFORCED PLASTIC MATERIAL, AND MANUFACTURING METHOD FOR FIBER-REINFORCED PLASTIC MATERIAL TORAY INDUSTRIES (JP) 2022-03-23 EP disclosed
US-20210149303-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2021-05-20 US disclosed
US-20210149302-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2021-05-20 US disclosed
US-20200354319-A1 MONOMERS CAPABLE OF DIMERIZING IN AN AQUEOUS SOLUTION, AND METHODS OF USING SAME UNIV CORNELL (US) 2020-11-12 US disclosed
US-20200183275-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2020-06-11 US disclosed
CN-102725273-A Clathrate and method for producing same NIPPON SODA CO 2012-10-10 CN disclosed
CN-101802049-B Epoxy resin composition for semiconductor encapsulation containing inclusion complex NIPPON SODA CO 2012-09-12 CN disclosed
EP-2489689-A1 COMPOSITION FOR FORMATION OF CURED EPOXY RESIN, AND CURED PRODUCTS THEREOF Nippon Soda Co., Ltd. (JP) 2012-08-22 EP disclosed
US-20120196991-A1 COMPOSITION FOR FORMATION OF CURED EPOXY RESIN, AND CURED PRODUCTS THEREOF NISSO CHEMICAL ANALYSIS SERVICE CO., LTD. (JP) 2012-08-02 US disclosed
CN-101802049-A Epoxy resin composition for semiconductor encapsulation containing inclusion complex NIPPON SODA CO 2010-08-11 CN disclosed
US-20100179250-A1 INCLUSION COMPLEX CONTAINING EPOXY RESIN COMPOSITION FOR SEMICONDUCTOR ENCAPSULATION NIPPON SODA CO., LTD. (JP) 2010-07-15 US disclosed
EP-2192139-A1 INCLUSION COMPLEX CONTAINING EPOXY RESIN COMPOSITION FOR SEMICONDUCTOR ENCAPSULATION Nippon Soda Co., Ltd. (JP) 2010-06-02 EP disclosed
EP-0656895-B1 Photochromic spiropyran compounds RODENSTOCK OPTIK G (DE) 2002-01-09 EP disclosed
EP-0656895-A1 PHOTOCHROMIC SPIROPYRAN COMPOUNDS Optische Werke G. Rodenstock (DE) 1995-06-14 EP disclosed
WO-1995000504-A1 PHOTOCHROMIC SPIROPYRAN COMPOUNDS OPTISCHE WERKE G. RODENSTOCK (DE) 1995-01-05 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11693313-B2 Resist composition and method of forming resist pattern C1R, C1S, C9 GRIN2D 1955/4885GRIN2A 2408/4885GRIN2B 1698/4885
US-20200354319-A1 MONOMERS CAPABLE OF DIMERIZING IN AN AQUEOUS SOLUTION, AND METHODS OF USING SAME CALCOCO2, MDN1, MBNL1 GRIN2D 3398/4885GRIN2A 2477/4885GRIN2B 2759/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.