Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PIK3CD | O00329 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | CA12 | O43570 | 3/20 | 0.31 |
| ▸ | CA1 | P00915 | 3/20 | 0.31 |
| ▸ | CA2 | P00918 | 3/20 | 0.31 |
| ▸ | CA9 | Q16790 | 3/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4823448 | 0.83 | TDP1 (0.35) | MAPK1 | |
| SCHEMBL14840121 | 0.79 | TSHR (0.35) | PIK3CDTSHRCA12CA1CA2 | |
| Ethylamine SCHEMBL22130020 | 0.76 | HSD17B10 (0.30) | ALDH1A1 | |
| SCHEMBL6158099 | 0.73 | THRB (0.42) | ALDH1A1 | |
| Hydrochloric Acid SCHEMBL11700064 | 0.71 | THRB (0.40) | ALDH1A1 | |
| SCHEMBL35604 | 0.70 | ALDH1A1 (0.41) | TSHRALDH1A1MAPK1 | |
| SCHEMBL28125944 | 0.70 | ALDH1A1 (0.41) | TSHRALDH1A1MAPK1 | |
| SCHEMBL1720232 | 0.69 | TSHR (0.39) | TSHRALDH1A1MAPK1 | |
| SCHEMBL6232031 | 0.69 | TSHR (0.39) | TSHRALDH1A1MAPK1 | |
| SCHEMBL79662 | 0.69 | ALDH1A1 (0.33) | TSHRALDH1A1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 390 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12359125-B2 | Silicon etchant composition, pattern formation method and manufacturing method of array substrate using the etchant composition, and array substrate manufactured therefrom | DONGWOO FINE-CHEM CO., LTD. (KR) | 2025-07-15 | — | — | US | claimed |
| CN-118339245-A | Polishing slurry composition | 凯斯科技股份有限公司 | 2024-07-12 | — | — | CN | claimed |
| CN-118145912-A | Composite air entraining agent for light concrete and preparation method thereof | 科之杰新材料集团有限公司 | 2024-06-07 | — | — | CN | claimed |
| US-20240174797-A1 | POLYESTERAMINES AND POLYESTERQUATS | ARKEMA FRANCE (FR) | 2024-05-30 | — | — | US | claimed |
| CN-117964278-A | Composite light concrete air entraining agent and preparation method thereof | 科之杰新材料集团有限公司 | 2024-05-03 | — | — | CN | claimed |
| CN-114231288-B | Silicon etching liquid composition, pattern forming method, array substrate manufacturing method, and array substrate | 东友精细化工有限公司 | 2023-12-26 | — | — | CN | claimed |
| US-11802179-B2 | Polyesteramines and polyesterquats | ARKEMA FRANCE (FR) | 2023-10-31 | — | — | US | claimed |
| EP-3668652-B1 | POLYESTERAMINES AND POLYESTER QUATS | ARKEMA FRANCE (FR) | 2023-09-06 | — | — | EP | claimed |
| WO-2023121037-A1 | POLISHING SLURRY COMPOSITION | 주식회사 케이씨텍 | 2023-06-29 | — | — | WO | claimed |
| CN-115198556-A | Melamine resin curing agent and preparation method thereof | 杭州临安迪恩化工有限公司 | 2022-10-18 | — | — | CN | claimed |
| CN-100341912-C | Organometallic-free polyurethanes containing low extractables | NOVEON IP HOLDINGS CORP (US) | 2007-10-10 | — | — | CN | claimed |
| WO-2006115393-A1 | AUTO-STOPPING ABRASIVE COMPOSITION FOR POLISHING HIGH STEP HEIGHT OXIDE LAYER | TECHNO SEMICHEM CO., LTD. (KR) | 2006-11-02 | — | — | WO | claimed |
| US-20060100411-A1 | Organometallic-free polyurethanes having low extractables | LUBRIZOL ADVANCED MATERIALS, INC. | 2006-05-11 | — | — | US | claimed |
| CN-1742032-A | Organometallic-free polyurethanes having low extractables | NOVEON IP HOLDINGS CORP (US) | 2006-03-01 | — | — | CN | claimed |
| EP-1572773-A1 | ORGANOMETALLIC-FREE POLYURETHANES HAVING LOW EXTRACTABLES | Noveon IP Holdings Corp. (US) | 2005-09-14 | — | — | EP | claimed |
| WO-2004060954-A1 | ORGANOMETALLIC-FREE POLYURETHANES HAVING LOW EXTRACTABLES | NOVEON IP HOLDINGS CORP. (US) | 2004-07-22 | — | — | WO | claimed |
| US-20040122202-A1 | Organometallic-free polyurethanes having low extractables | NOVEON, INC. | 2004-06-24 | — | — | US | claimed |
| EP-0752977-B1 | AIR ENTRAINING AGENT FOR CONCRETES AND MORTARS | KREMS CHEMIE AG (AT) | 1998-10-28 | — | — | EP | claimed |
| US-5759259-A | CONTAINING A ROSIN SALT | KREMS CHEMIE AKTIENGESELLSCHAFT (AT) | 1998-06-02 | — | — | US | claimed |
| US-5201944-A | Mixtures containing rosins esterified by alkanol tertiary amines and others by carbonylation with acrylic carbonyl compounds, casein, surfactants, and having nearly neutral PH | HARIMA CHEMICALS, INC. (JP) | 1993-04-13 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240174797-A1 | POLYESTERAMINES AND POLYESTERQUATS | PUF60, CUTA, ASH2L | PIK3CD 1389/4885TSHR 3875/4885CA12 901/4885 |
| US-11802179-B2 | Polyesteramines and polyesterquats | PUF60, CUTA, ASH2L | PIK3CD 1389/4885TSHR 3875/4885CA12 901/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.