⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8512986 | 0.86 | — | — | |
| SCHEMBL482457 | 0.77 | TSHR (0.44) | — | |
| SCHEMBL246106 | 0.72 | TSHR (0.39) | — | |
| SCHEMBL1671825 | 0.71 | PDCD1 (0.49) | — | |
| SCHEMBL382685 | 0.68 | TSHR (0.47) | — | |
| SCHEMBL1671877 | 0.68 | ESR1 (0.39) | — | |
| SCHEMBL482458 | 0.67 | TSHR (0.46) | — | |
| Hydrogen Sulfide SCHEMBL2882266 | 0.67 | TSHR (0.46) | — | |
| SCHEMBL2882269 | 0.67 | TSHR (0.42) | — | |
| SCHEMBL1671636 | 0.66 | PDCD1 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2256551-B1 | Pattern forming process using a chemically amplified resist composition | SHINETSU CHEMICAL CO (JP) | 2015-05-13 | — | — | EP | disclosed |
| US-8288076-B2 | Chemically amplified resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-20100304302-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| EP-2256551-A1 | Chemically amplified resist compositon and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-12-01 | — | — | EP | disclosed |