SCHEMBL3411389

SCHEMBL3411389

C=C(C)C(=O)OOP(=O)(OOC(=O)C(=C)C)OOC(=O)C(=C)C

nearest known ligand 0.46

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.46
TSHR P16473 3/20 0.37
THRB P10828 1/20 0.34
TDP1 Q9NUW8 2/20 0.33
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547333 0.83 TSHR (0.44) ALDH1A1TSHRTHRBTDP1
SCHEMBL28193426 0.83 TSHR (0.44) ALDH1A1TSHRTHRBTDP1
SCHEMBL31202748 0.83 TSHR (0.43) ALDH1A1TSHRTHRB
SCHEMBL908616 0.83 ALDH1A1 (0.44) ALDH1A1TSHRTHRBTDP1
SCHEMBL25231466 0.81 ALDH1A1 (0.42) ALDH1A1TSHRTHRBTDP1
SCHEMBL2215339 0.78 ALDH1A1 (0.61) ALDH1A1TSHRTHRBTDP1HSD17B10
SCHEMBL28083768 0.78 ALDH1A1 (0.44) ALDH1A1TSHRTHRB
SCHEMBL5720290 0.76 BTN3A1 (0.37) ALDH1A1TSHRTHRB
SCHEMBL28581827 0.76 ALDH1A1 (0.42) ALDH1A1TSHRTHRBTDP1
SCHEMBL1072961 0.76 ALDH1A1 (0.38) ALDH1A1TSHRTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024164848-A1 DENTAL ADHESIVE COMPOSITION AND PREPARATION METHOD THEREFOR AND USE THEREOF 爱迪特(秦皇岛)科技股份有限公司 2024-08-15 WO claimed
CN-119173600-A Insulating adhesive tape 爱天思株式会社 2024-12-20 CN disclosed
WO-2023219047-A1 INSULATIVE ADHESIVE TAPE 東洋インキSCホールディングス株式会社 2023-11-16 WO disclosed
EP-3018118-B1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2023-07-05 EP disclosed
CN-107848963-B Acid-resistant alkali-producing agent and/or radical-producing agent, and curable resin composition containing same 富士胶片和光纯药株式会社 2020-11-03 CN disclosed
EP-3327002-B1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2020-08-19 EP disclosed
US-10428014-B2 Base generator, base-reactive composition containing said base generator, and base generation method FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-01 US disclosed
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-01 US disclosed
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-01-03 US disclosed
EP-3098226-B1 BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2018-12-12 EP disclosed
US-20120157564-A1 ENERGY RAY-CURABLE ELASTOMER COMPOSITION BRIDGESTONE CORPORATION (JP) 2012-06-21 US disclosed
US-20100015360-A1 AQUEOUS INK COMPOSITION, AQUEOUS INK COMPOSITION FOR INKJET RECORDING, AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2010-01-21 US disclosed
EP-2145932-A1 Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method Fujifilm Corporation (JP) 2010-01-20 EP disclosed
US-7217743-B2 Curable white ink KONICA CORPORATION (JP) 2007-05-15 US disclosed
US-6900250-B2 Polymerizable composition TOYO INK MFG. CO., LTD. (JP) 2005-05-31 US disclosed
US-20040019128-A1 Curable white ink KONICA CORPORATION (JP) 2004-01-29 US disclosed
US-20030212162-A1 Photopolymerization using photoinitiators TOYO INK MFG. CO., LTD. (JP) 2003-11-13 US disclosed
US-5629358-A Photocurable resin composition containing acrylate silane and epoxy silane and/or their hydrolysis products IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1997-05-13 US disclosed
EP-0549228-B1 Photocurable resin composition NAT STARCH CHEM INVEST (US) 1996-08-28 EP disclosed
EP-0549228-A2 Photocurable resin composition National Starch and Chemical Investment Holding Corporation (US) 1993-06-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator REV1, RER1, CBR1 ALDH1A1 847/4885TSHR 1154/4885THRB 2566/4885
US-10428014-B2 Base generator, base-reactive composition containing said base generator, and base generation method HPRT1, GNG2, BLM ALDH1A1 1468/4885TSHR 2081/4885THRB 3306/4885
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR REV1, RER1, CBR1 ALDH1A1 847/4885TSHR 1154/4885THRB 2566/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.