Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | TYR | P14679 | 1/20 | 0.44 |
| ▸ | KIF11 | P52732 | 2/20 | 0.43 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.40 |
| ▸ | BCHE | P06276 | 13/20 | 0.39 |
| ▸ | ACHE | P22303 | 13/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2441576 | 0.85 | TSHR (0.46) | TSHRLMNATYRKIF11HDAC1 | |
| SCHEMBL70734 | 0.76 | TSHR (0.52) | TSHRLMNATYRKIF11HDAC1 | |
| SCHEMBL12762156 | 0.76 | TSHR (0.52) | TSHRLMNATYRKIF11HDAC1 | |
| SCHEMBL424728 | 0.74 | TSHR (0.73) | TSHRLMNATYRKIF11HDAC1 | |
| Water SCHEMBL515827 | 0.74 | TSHR (0.50) | TSHRLMNATYRKIF11HDAC1 | |
| Iodide SCHEMBL2968443 | 0.74 | TSHR (0.50) | TSHRLMNATYRKIF11HDAC1 | |
| Bromide SCHEMBL10810288 | 0.74 | TSHR (0.50) | TSHRLMNATYRKIF11HDAC1 | |
| Hydrochloric Acid SCHEMBL217655 | 0.74 | TSHR (0.50) | TSHRLMNATYRKIF11HDAC1 | |
| SCHEMBL4494377 | 0.74 | TSHR (0.50) | TSHRLMNATYRKIF11HDAC1 | |
| SCHEMBL722705 | 0.72 | TSHR (0.48) | TSHRLMNATYRKIF11HDAC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | claimed |
| US-20080085463-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. | 2008-04-10 | — | — | US | claimed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | claimed |
| US-8455176-B2 | Coating composition | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-06-04 | — | — | US | disclosed |
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | disclosed |
| US-20100119972-A1 | COATING COMPOSITION | MERCK PATENT GMBH (DE) | 2010-05-13 | — | — | US | disclosed |
| US-7547501-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-06-16 | — | — | US | disclosed |
| US-7521170-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-04-21 | — | — | US | disclosed |
| US-20080187868-A1 | Photoactive Compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2008-08-07 | — | — | US | disclosed |
| US-20080171270-A1 | Polymers Useful in Photoresist Compositions and Compositions Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2008-07-17 | — | — | US | disclosed |
| US-20080085463-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. | 2008-04-10 | — | — | US | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100119972-A1 | COATING COMPOSITION | S100A9, CAPG, C5 | TSHR 4827/4885LMNA 603/4885TYR 1405/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.