SCHEMBL2441576

SCHEMBL2441576

CC(C)(C)c1ccc([I+]C[I+]c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 1/20 0.46
▸ LMNA P02545 1/20 0.44
▸ TYR P14679 1/20 0.44
▸ BCHE P06276 13/20 0.39
▸ ACHE P22303 13/20 0.39
▸ KIF11 P52732 2/20 0.38
▸ ALDH1A1 P00352 2/20 0.37
▸ NPC1 O15118 1/20 0.35
▸ MAPT P10636 1/20 0.35
▸ HPGD P15428 1/20 0.35
▸ MAPK1 P28482 1/20 0.35
▸ RAB9A P51151 1/20 0.35
▸ HDAC1 Q13547 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3417672 0.85 TSHR (0.46) TSHRLMNATYRBCHEACHE
SCHEMBL70734 0.76 TSHR (0.52) TSHRLMNATYRBCHEACHE
SCHEMBL12762156 0.76 TSHR (0.52) TSHRLMNATYRBCHEACHE
SCHEMBL424728 0.74 TSHR (0.73) TSHRLMNATYRBCHEACHE
Iodide SCHEMBL2968443 0.74 TSHR (0.50) TSHRLMNATYRBCHEACHE
SCHEMBL4494377 0.74 TSHR (0.50) TSHRLMNATYRBCHEACHE
Bromide SCHEMBL10810288 0.74 TSHR (0.50) TSHRLMNATYRBCHEACHE
Hydrochloric Acid SCHEMBL217655 0.74 TSHR (0.50) TSHRLMNATYRBCHEACHE
Water SCHEMBL515827 0.74 TSHR (0.50) TSHRLMNATYRBCHEACHE
SCHEMBL722705 0.72 TSHR (0.48) TSHRLMNATYRBCHEACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2078028-B1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA (US) 2011-09-07 — — EP claimed
EP-2121783-A1 POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF AZ Electronic Materials USA Corp. (US) 2009-11-25 — — EP claimed
US-7601480-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-10-13 — — US claimed
EP-2102184-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-09-23 — — EP claimed
EP-2102156-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-09-23 — — EP claimed
EP-2078028-A1 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-07-15 — — EP claimed
US-7491482-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-02-17 — — US claimed
WO-2008087549-A1 POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-07-24 — — WO claimed
US-20080171270-A1 Polymers Useful in Photoresist Compositions and Compositions Thereof AZ ELECTRONIC MATERIALS USA CORP. 2008-07-17 — — US claimed
US-20080153032-A1 Photoactive Compounds MERCK PATENT GMBH (DE) 2008-06-26 — — US claimed
US-7390613-B1 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2008-06-24 — — US claimed
WO-2008068617-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-06-12 — — WO claimed
WO-2008068610-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-06-12 — — WO claimed
US-20080131810-A1 Photoactive Compounds MERCK PATENT GMBH (DE) 2008-06-05 — — US claimed
WO-2008041123-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-04-10 — — WO claimed
US-20080085463-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONICS MATERIALS USA CORP. 2008-04-10 — — US claimed
US-20070015084-A1 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity MERCK PATENT GMBH (DE) 2007-01-18 — — US claimed
US-9146467-B2 Coating compositions MERCK PATENT GMBH (DE) 2015-09-29 — — US disclosed
WO-2008041123-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-04-10 — — WO disclosed
US-20070015084-A1 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity MERCK PATENT GMBH (DE) 2007-01-18 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080131810-A1 Photoactive Compounds CRY2, AOC2, AFF2 TSHR 3997/4885LMNA 1568/4885TYR 34/4885
US-20080153032-A1 Photoactive Compounds SUN2, CRY2, SCO2 TSHR 4095/4885LMNA 3487/4885TYR 693/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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