Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 1/20 | 0.56 |
| ▸ | P2RY14 | Q15391 | 1/20 | 0.56 |
| ▸ | PRMT1 | Q99873 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 7/20 | 0.48 |
| ▸ | CA1 | P00915 | 7/20 | 0.48 |
| ▸ | CA2 | P00918 | 7/20 | 0.48 |
| ▸ | CA9 | Q16790 | 7/20 | 0.48 |
| ▸ | CA7 | P43166 | 6/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 6/20 | 0.48 |
| ▸ | CA6 | P23280 | 4/20 | 0.48 |
| ▸ | CA4 | P22748 | 3/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.48 |
| ▸ | MAPT | P10636 | 2/20 | 0.48 |
| ▸ | CA3 | P07451 | 2/20 | 0.48 |
| ▸ | CA5A | P35218 | 2/20 | 0.48 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | SELL | P14151 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27360806 | 0.88 | SLC6A2 (0.59) | SLC6A2P2RY14PRMT1CA12CA1 | |
| SCHEMBL1681429 | 0.85 | PRMT1 (0.63) | SLC6A2P2RY14PRMT1CA12CA1 | |
| SCHEMBL3391281 | 0.85 | CA12 (0.50) | SLC6A2P2RY14PRMT1CA12CA1 | |
| SCHEMBL10026215 | 0.83 | PTPN1 (0.51) | SLC6A2P2RY14CA12CA1CA2 | |
| SCHEMBL12193501 | 0.81 | SLC6A2 (0.54) | SLC6A2P2RY14PRMT1CA12CA1 | |
| SCHEMBL2186294 | 0.81 | SLC6A2 (0.54) | SLC6A2P2RY14PRMT1CA12CA1 | |
| SCHEMBL4565723 | 0.81 | CASP6 (0.54) | SLC6A2P2RY14PRMT1CA12CA1 | |
| SCHEMBL163553 | 0.78 | PRMT1 (0.56) | SLC6A2P2RY14PRMT1CA12CA1 | |
| SCHEMBL21979549 | 0.78 | BCL2L1 (0.67) | SLC6A2P2RY14PRMT1CA12CA1 | |
| SCHEMBL30514356 | 0.78 | BCL2L1 (0.67) | SLC6A2P2RY14PRMT1CA12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11693313-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-11693313-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| WO-2023287067-A1 | ANTIBACTERIAL COMPOUND | 주식회사 엘지화학 | 2023-01-19 | — | — | WO | disclosed |
| US-20220121118-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-21 | — | — | US | disclosed |
| EP-3230339-B1 | EPOXY RESIN COMPOSITION, PREPREG, FIBER-REINFORCED PLASTIC MATERIAL, AND MANUFACTURING METHOD FOR FIBER-REINFORCED PLASTIC MATERIAL | TORAY INDUSTRIES (JP) | 2022-03-23 | — | — | EP | disclosed |
| US-20210149303-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-20 | — | — | US | disclosed |
| US-20210149302-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-20 | — | — | US | disclosed |
| US-20200183275-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-11 | — | — | US | disclosed |
| US-20200183273-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-11 | — | — | US | disclosed |
| CN-107001594-B | Composition epoxy resin, prepreg, the manufacturing method of fiber reinforced plastic materials and fiber reinforced plastic materials | 东丽株式会社 | 2019-07-23 | — | — | CN | disclosed |
| US-8653160-B2 | Inclusion complex containing epoxy resin composition for semiconductor encapsulation | NIPPON SODA CO., LTD. (JP) | 2014-02-18 | — | — | US | disclosed |
| EP-2573148-A1 | CURABLE POWDER COATING COMPOSITION, AND CURED PRODUCT OF SAME | Nippon Soda Co., Ltd. (JP) | 2013-03-27 | — | — | EP | disclosed |
| US-20130059942-A1 | CURABLE POWDER COATING COMPOSITION, AND CURED PRODUCT OF SAME | NIPPON SODA CO., LTD. (JP) | 2013-03-07 | — | — | US | disclosed |
| CN-102725273-A | Clathrate and method for producing same | NIPPON SODA CO | 2012-10-10 | — | — | CN | disclosed |
| CN-101802049-B | Epoxy resin composition for semiconductor encapsulation containing inclusion complex | NIPPON SODA CO | 2012-09-12 | — | — | CN | disclosed |
| EP-2489689-A1 | COMPOSITION FOR FORMATION OF CURED EPOXY RESIN, AND CURED PRODUCTS THEREOF | Nippon Soda Co., Ltd. (JP) | 2012-08-22 | — | — | EP | disclosed |
| US-20120196991-A1 | COMPOSITION FOR FORMATION OF CURED EPOXY RESIN, AND CURED PRODUCTS THEREOF | NISSO CHEMICAL ANALYSIS SERVICE CO., LTD. (JP) | 2012-08-02 | — | — | US | disclosed |
| CN-101802049-A | Epoxy resin composition for semiconductor encapsulation containing inclusion complex | NIPPON SODA CO | 2010-08-11 | — | — | CN | disclosed |
| US-20100179250-A1 | INCLUSION COMPLEX CONTAINING EPOXY RESIN COMPOSITION FOR SEMICONDUCTOR ENCAPSULATION | NIPPON SODA CO., LTD. (JP) | 2010-07-15 | — | — | US | disclosed |
| EP-2192139-A1 | INCLUSION COMPLEX CONTAINING EPOXY RESIN COMPOSITION FOR SEMICONDUCTOR ENCAPSULATION | Nippon Soda Co., Ltd. (JP) | 2010-06-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11693313-B2 | Resist composition and method of forming resist pattern | C1R, C1S, C9 | SLC6A2 4086/4885P2RY14 3128/4885PRMT1 1386/4885 |
| US-20200183273-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | SLC11A2, RPP30, RDX | SLC6A2 1400/4885P2RY14 1592/4885PRMT1 379/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.