SCHEMBL3423319

SCHEMBL3423319

COCc1ccc(COC)cc1.Oc1ccccc1C1(c2ccccc2O)c2ccccc2-c2ccccc21

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDK2 Q15119 7/20 0.50
ESR1 P03372 1/20 0.41
ESR2 Q92731 1/20 0.41
APP P05067 1/20 0.35
KDM4E B2RXH2 2/20 0.33
LMNA P02545 2/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
TSHR P16473 2/20 0.33
MAPK1 P28482 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
GAA P10253 1/20 0.33
TP53 P04637 2/20 0.33
MDM2 Q00987 1/20 0.33
MAPT P10636 2/20 0.33
ALDH1A1 P00352 1/20 0.33
ITGA4 P13612 1/20 0.33
KEAP1 Q14145 1/20 0.33
OPRK1 P41145 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19002147 0.81 MEN1 (0.52) PDK2ESR1ESR2KDM4ELMNA
SCHEMBL382439 0.80 ESR1 (0.50) PDK2ESR1ESR2KDM4ELMNA
SCHEMBL29646285 0.80 ESR1 (0.50) PDK2ESR1ESR2KDM4ELMNA
SCHEMBL29482233 0.80 ESR1 (0.50) PDK2ESR1ESR2KDM4ELMNA
SCHEMBL13497452 0.76 LMNA (0.50) PDK2ESR1ESR2APPKDM4E
SCHEMBL21451597 0.74 PDK2 (0.49) PDK2ESR1ESR2KDM4ELMNA
SCHEMBL26257703 0.73 PDK2 (0.43) PDK2ESR1ESR2KDM4ELMNA
SCHEMBL13497453 0.73 LMNA (0.47) PDK2ESR1ESR2APPLMNA
SCHEMBL20741395 0.72 PDK2 (0.51) PDK2ESR1ESR2KDM4ELMNA
SCHEMBL20795883 0.71 PDK2 (0.50) PDK2ESR1ESR2KDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7655386-B2 Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device CHEIL INDUSTRIES, INC. (KR) 2010-02-02 US disclosed