SCHEMBL3454233

SCHEMBL3454233

O=C(OCCS(=O)(=O)[O-])C1CCCCC1.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.41
MAPT P10636 3/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
ATM Q13315 1/20 0.39
POLB P06746 1/20 0.39
ELANE P08246 1/20 0.39
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
CYP2C19 P33261 1/20 0.37
PKM P14618 2/20 0.37
NPC1 O15118 1/20 0.37
EPHX2 P34913 1/20 0.37
RAB9A P51151 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
ADORA2A P29274 1/20 0.37
HPGD P15428 1/20 0.37
FKBP1A P62942 2/20 0.36
NPSR1 Q6W5P4 1/20 0.36
HSD17B10 Q99714 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3455541 0.82 ALDH1A1 (0.41) ALDH1A1MAPTL3MBTL1MEN1KMT2A
SCHEMBL3756010 0.80 ALDH1A1 (0.38) ALDH1A1MAPTL3MBTL1ATMPOLB
SCHEMBL3456472 0.77 TDP1 (0.53) ALDH1A1L3MBTL1KMT2ANPC1RAB9A
Carbon Monoxide SCHEMBL3454235 0.77 ALDH1A1 (0.34) ALDH1A1POLBNPC1RAB9ASMN1; SMN2
SCHEMBL3454239 0.75 LMNA (0.43) ALDH1A1MAPTPOLBELANEMEN1
SCHEMBL3454237 0.73 KMT2A (0.43) ALDH1A1MAPTL3MBTL1ATMPOLB
SCHEMBL3454497 0.73 ALDH1A1 (0.45) ALDH1A1MAPTPOLBKMT2ACYP2C19
SCHEMBL2472015 0.72 HPGD (0.46) ALDH1A1POLBELANECYP2C19PKM
SCHEMBL10170649 0.72 ELANE (0.67) ALDH1A1MAPTL3MBTL1ATMPOLB
SCHEMBL3454523 0.71 MIF (0.36) ALDH1A1MAPTL3MBTL1ATMPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8394570-B2 Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-12 US disclosed
US-20100143830-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100143830-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS TYK2, VRK2, ARSA ALDH1A1 3818/4885MAPT 3598/4885L3MBTL1 2427/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.