SCHEMBL3454239

SCHEMBL3454239

CC(OC(=O)C1CCCCC1)S(=O)(=O)[O-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
POLB P06746 2/20 0.39
ELANE P08246 1/20 0.39
ALDH1A1 P00352 1/20 0.38
MAPT P10636 1/20 0.38
HTR1E P28566 1/20 0.38
S1PR3 Q99500 1/20 0.38
RAB9A P51151 1/20 0.37
CYP1A2 P05177 1/20 0.36
CYP2D6 P10635 1/20 0.36
SCN1A P35498 1/20 0.36
SCN2A Q99250 1/20 0.36
SCN3A Q9NY46 1/20 0.36
TSHR P16473 1/20 0.36
HPGD P15428 1/20 0.35
RECQL P46063 1/20 0.35
USP30 Q70CQ3 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3455547 0.82 SMN1; SMN2 (0.38) LMNASMN1; SMN2POLBALDH1A1TSHR
SCHEMBL546232 0.78 LMNA (0.41) LMNASMN1; SMN2POLBELANEALDH1A1
SCHEMBL3454233 0.75 ALDH1A1 (0.41) SMN1; SMN2POLBELANEALDH1A1MAPT
SCHEMBL3756010 0.75 ALDH1A1 (0.38) LMNAPOLBELANEALDH1A1MAPT
SCHEMBL546278 0.74 ALDH1A1 (0.39) LMNASMN1; SMN2ALDH1A1MAPTHTR1E
SCHEMBL2472015 0.72 HPGD (0.46) LMNASMN1; SMN2POLBELANEALDH1A1
SCHEMBL10170649 0.72 ELANE (0.67) SMN1; SMN2POLBELANEALDH1A1MAPT
SCHEMBL22791138 0.71 LMNA (0.58) LMNASMN1; SMN2POLBELANEALDH1A1
SCHEMBL7904552 0.70 ALDH1A1 (0.41) SMN1; SMN2POLBALDH1A1MAPTRAB9A
SCHEMBL12603632 0.70 ELANE (0.64) SMN1; SMN2POLBELANEALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8394570-B2 Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-12 US disclosed
US-20100143830-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100143830-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS TYK2, VRK2, ARSA LMNA 3254/4885SMN1; SMN2 1738/4885POLB 1130/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.