SCHEMBL7904552

SCHEMBL7904552

O=S(=O)([O-])C1CCCCC1.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.41
KDM4E B2RXH2 2/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
ACHE P22303 1/20 0.39
MAPT P10636 1/20 0.38
ESR1 P03372 1/20 0.36
HSP90AA1 P07900 2/20 0.35
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
USP2 O75604 1/20 0.35
HPGD P15428 1/20 0.35
HSD17B10 Q99714 1/20 0.35
GAA P10253 1/20 0.35
POLB P06746 1/20 0.35
RAB9A P51151 1/20 0.35
MMP8 P22894 2/20 0.34
MMP13 P45452 2/20 0.34
MMP1 P03956 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL794908 0.84 MMP8 (0.43) ALDH1A1KDM4EMEN1KMT2AMAPT
SCHEMBL8135143 0.84 POLB (0.38) ALDH1A1KDM4EMEN1KMT2AACHE
Cyclamic Acid SCHEMBL1616716 0.80 CA12 (0.59) ALDH1A1KDM4EMEN1KMT2AMAPT
SCHEMBL7164631 0.80 ALDH1A1 (0.37) ALDH1A1KDM4EMEN1KMT2AACHE
SCHEMBL7905668 0.79 ALDH1A1 (0.42) ALDH1A1KDM4EMEN1KMT2AACHE
Trifluoromethanesulfonic Acid SCHEMBL12275611 0.79 MMP8 (0.38) ALDH1A1KDM4EMEN1KMT2AMAPT
Sulfuric Acid SCHEMBL5798230 0.77 HTR6 (0.39) ALDH1A1MEN1KMT2ASMN1; SMN2HSD17B10
SCHEMBL795416 0.77 ENPP1 (0.46) ALDH1A1KDM4EMEN1KMT2APOLB
SCHEMBL137132 0.76 HTR6 (0.46) ALDH1A1MEN1KMT2ASMN1; SMN2HSD17B10
SCHEMBL702656 0.76 ALDH1A1 (0.39) ALDH1A1KDM4EMEN1KMT2AACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6200480-B1 CONTACTING IMPURE SOLUTION OF PHOTOACID GENERATING COMPOUND CONTAINING TRACE AMOUNTS OF ACIDIC IMPURITIES WITH ANIONIC ION EXCHANGE RESIN CONTAINING PENDENT POLYAMINE FUNCTIONAL GROUPS FOR SUFFICIENT AMOUNT OF TIME TO REMOVE SAID IMPURITIES ARCH SPECIALTY CHEMICALS, INC. 2001-03-13 US claimed
EP-1054715-A1 METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS Olin Microelectronic Chemicals, Inc. (US) 2000-11-29 EP claimed
WO-1999036151-A1 METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS OLIN MICROELECTRONIC CHEMICALS, INC. (US) 1999-07-22 WO claimed
US-6200480-B1 CONTACTING IMPURE SOLUTION OF PHOTOACID GENERATING COMPOUND CONTAINING TRACE AMOUNTS OF ACIDIC IMPURITIES WITH ANIONIC ION EXCHANGE RESIN CONTAINING PENDENT POLYAMINE FUNCTIONAL GROUPS FOR SUFFICIENT AMOUNT OF TIME TO REMOVE SAID IMPURITIES ARCH SPECIALTY CHEMICALS, INC. 2001-03-13 US disclosed
EP-1054715-A1 METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS Olin Microelectronic Chemicals, Inc. (US) 2000-11-29 EP disclosed
WO-1999036151-A1 METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS OLIN MICROELECTRONIC CHEMICALS, INC. (US) 1999-07-22 WO disclosed