SCHEMBL348034

SCHEMBL348034

CC(=O)C/C(C)=N\CC/N=C(/C)CC(C)=O

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 1.00
MGAM O43451 1/20 0.39
GAA P10253 1/20 0.39
SI P14410 1/20 0.39
MGAM2 Q2M2H8 1/20 0.39
ALDH1A1 P00352 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
KDM4E B2RXH2 1/20 0.35
KDM6B O15054 1/20 0.35
KDM5C P41229 1/20 0.35
EGLN1 Q9GZT9 1/20 0.35
PHF8 Q9UPP1 1/20 0.35
KDM2A Q9Y2K7 1/20 0.35
TRPA1 O75762 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3389582 1.00 HTT (1.00) HTTMGAMGAASIMGAM2
SCHEMBL351512 1.00 HTT (1.00) HTTMGAMGAASIMGAM2
SCHEMBL348035 1.00 HTT (1.00) HTTMGAMGAASIMGAM2
SCHEMBL7746127 0.97 HTT (0.94) HTTMGAMGAASIMGAM2
SCHEMBL348060 0.87 HTT (0.76) HTTMGAMGAASIMGAM2
SCHEMBL346894 0.87 HTT (0.76) HTTMGAMGAASIMGAM2
SCHEMBL346893 0.87 HTT (0.76) HTTMGAMGAASIMGAM2
SCHEMBL9959054 0.87 HTT (0.76) HTTMGAMGAASIMGAM2
SCHEMBL16627957 0.87 HTT (0.76) HTTMGAMGAASIMGAM2
SCHEMBL348061 0.87 HTT (0.76) HTTMGAMGAASIMGAM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4460682-A NONDIFFUSING COBALT(III) COMPLEX KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1984-07-17 US claimed
JP-8259528-A None JP disclosed
EP-3020766-B1 CURING ACCELERATOR FOR OXIDATION POLYMERIZED UNSATURATED RESIN, PRINTING INK, AND COATING MATERIAL DAINIPPON INK & CHEMICALS (JP) 2019-11-20 EP disclosed
US-9896603-B2 Curing accelerator for oxidative polymerization-type unsaturated resin, printing ink, and coating material DIC CORPORATION (JP) 2018-02-20 US disclosed
EP-2468801-B1 PROCESS FOR PRODUCING THERMOPLASTIC RESIN COMPOSITION, MOLDED OBJECT, AND LUMINESCENT OBJECT MITSUBISHI RAYON CO (JP) 2017-04-26 EP disclosed
US-20160152867-A1 CURING ACCELERATOR FOR OXIDATIVE POLYMERIZATION-TYPE UNSATURATED RESIN, PRINTING INK, AND COATING MATERIAL DIC CORPORATION (JP) 2016-06-02 US disclosed
EP-3020766-A1 CURING ACCELERATOR FOR OXIDATION POLYMERIZED UNSATURATED RESIN, PRINTING INK, AND COATING MATERIAL DIC Corporation (JP) 2016-05-18 EP disclosed
US-8889785-B2 Production method of thermoplastic resin composition, molded body, and light emission body MITSUBISHI RAYON CO., LTD. (JP) 2014-11-18 US disclosed
US-20120214922-A1 PRODUCTION METHOD OF THERMOPLASTIC RESIN COMPOSITION, MOLDED BODY, AND LIGHT EMISSION BODY MITSUBISHI RAYON CO., LTD. (JP) 2012-08-23 US disclosed
EP-2468801-A1 PROCESS FOR PRODUCING THERMOPLASTIC RESIN COMPOSITION, MOLDED OBJECT, AND LUMINESCENT OBJECT Mitsubishi Rayon Co., Ltd. (JP) 2012-06-27 EP disclosed
US-20120016147-A1 METHOD FOR PRODUCING AROMATIC COMPOUND POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-01-19 US disclosed
US-8048982-B2 Method for producing aromatic compound polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-11-01 US disclosed
EP-2241548-A1 Vanadium di-nuclear complex Sumitomo Chemical Company, Limited (JP) 2010-10-20 EP disclosed
EP-2241547-A1 Method for producing aromatic compound polymer Sumitomo Chemical Company, Limited (JP) 2010-10-20 EP disclosed
US-20090018309-A1 Method for Producing Aromatic Compound Polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-15 US disclosed
EP-1767560-A1 METHOD FOR PRODUCING AROMATIC COMPOUND POLYMER Sumitomo Chemical Company, Limited (JP) 2007-03-28 EP disclosed
US-6810575-B1 COMPRISES SUBSTRATE HAVING ON UPPER SURFACE A PLURALITY OF METAL OXIDE NEEDLES EXTENDING UPWARDLY OF SURFACE WITH THEIR CENTRAL AXES PARALLEL WITH EACH OTHER; NEEDLES HAVE SPECIFIC AVERAGE CIRCLE-BASED DIAMETER, ASPECT RATIO; CAPACITOR ASAHI KASAI CHEMICALS CORPORATION (JP) 2004-11-02 US disclosed
JP-H08259528-A PRODUCTION OF ARYLALKYLHYDROPEROXIDE COMPOUNDS MITSUI PETROCHEM IND LTD 1996-10-08 JP disclosed
US-4460682-A NONDIFFUSING COBALT(III) COMPLEX KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1984-07-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090018309-A1 Method for Producing Aromatic Compound Polymer PAH, MAOA, AHR HTT 1976/4885MGAM 4150/4885GAA 1983/4885
US-20120016147-A1 METHOD FOR PRODUCING AROMATIC COMPOUND POLYMER PAH, MAOA, AHR HTT 2001/4885MGAM 4127/4885GAA 1917/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.