SCHEMBL3481447

SCHEMBL3481447

CCCCCCC(CCCC)O[SiH3]

nearest known ligand 0.46

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 2/20 0.46
LMNA P02545 1/20 0.41
TSHR P16473 1/20 0.40
THRB P10828 1/20 0.40
CA2 P00918 1/20 0.39
OPRM1 P35372 1/20 0.39
SMPD1 P17405 3/20 0.38
FDPS P14324 3/20 0.37
GPR84 Q9NQS5 2/20 0.37
SPHK1 Q9NYA1 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27323251 1.00 DNM1 (0.46) DNM1LMNATSHRTHRBCA2
SCHEMBL11210376 1.00 DNM1 (0.46) DNM1LMNATSHRTHRBCA2
SCHEMBL3482199 0.97 DNM1 (0.42) DNM1LMNATSHRTHRBCA2
SCHEMBL4766710 0.97 LMNA (0.42) DNM1LMNATSHRTHRBOPRM1
SCHEMBL6057154 0.97 LMNA (0.42) DNM1LMNATSHRTHRBOPRM1
SCHEMBL11207866 0.97 LMNA (0.42) DNM1LMNATSHRTHRBOPRM1
SCHEMBL7056921 0.97 LMNA (0.42) DNM1LMNATSHRTHRBOPRM1
SCHEMBL3796584 0.97 LMNA (0.42) DNM1LMNATSHRTHRBOPRM1
SCHEMBL6057209 0.97 LMNA (0.42) DNM1LMNATSHRTHRBOPRM1
SCHEMBL4770413 0.95 OPRM1 (0.42) DNM1LMNATSHRTHRBOPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4056604-B1 METHOD FOR PRODUCING COPOLYMER OF 1,3,7-OCTATRIENE AND STYRENE KURARAY CO (JP) 2023-08-02 EP disclosed
EP-3564280-B1 COPOLYMER OF 1, 3, 7-OCTATRIENE AND STYRENE AND HYDRIDE THEREOF KURARAY CO (JP) 2023-07-26 EP disclosed
EP-4163312-A1 COPOLYMER OF 1,3,7-OCTATRIENE AND ISOPRENE, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID COPOLYMER Kuraray Co., Ltd. (JP) 2023-04-12 EP disclosed
EP-4163311-A1 COPOLYMER OF 1,3,7-OCTATRIENE AND ISOPRENE, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID COPOLYMER Kuraray Co., Ltd. (JP) 2023-04-12 EP disclosed
EP-3564274-B1 1, 3, 7-OCTATRIENE POLYMER, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID POLYMER KURARAY CO (JP) 2022-12-28 EP disclosed
EP-4056604-A1 METHOD FOR PRODUCING COPOLYMER OF 1,3,7-OCTATRIENE AND STYRENE Kuraray Co., Ltd. (JP) 2022-09-14 EP disclosed
US-11332567-B2 Copolymer of 1, 3, 7-octatriene and butadiene, hydride thereof, and method for producing said copolymer KURARAY CO., LTD. (JP) 2022-05-17 US disclosed
US-11198744-B2 1,3, 7-octatriene polymer, hydride thereof, and method for producing said polymer KURARAY CO., LTD. (JP) 2021-12-14 US disclosed
US-11091578-B2 Copolymer of 1,3,7-octatriene and isoprene, hydride thereof, and method for producing said copolymer KURARAY CO., LTD. (JP) 2021-08-17 US disclosed
US-10995249-B2 Tire with reduced cavity noise HANKOOK TIRE CO., LTD. 2021-05-04 US disclosed
EP-3162816-B1 METHOD FOR MANUFACTURING HYDROGENATED POLYMER KURARAY CO (JP) 2019-01-02 EP disclosed
US-20180282600-A1 TIRE WITH REDUCED CAVITY NOISE HANKOOK TIRE CO., LTD. (KR) 2018-10-04 US disclosed
EP-3381712-A1 TIRE WITH REDUCED CAVITY NOISE Hankook Tire Co., Ltd. (KR) 2018-10-03 EP disclosed
US-20180134933-A1 TIRE WITH REDUCED CAVITY NOISE HANKOOK TIRE CO., LTD. (KR) 2018-05-17 US disclosed
EP-3321108-A1 TIRE WITH REDUCED CAVITY NOISE Hankook Tire Co., Ltd. (KR) 2018-05-16 EP disclosed
EP-3162816-A1 METHOD FOR MANUFACTURING HYDROGENATED POLYMER Kuraray Co., Ltd. (JP) 2017-05-03 EP disclosed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed