Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.55 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.45 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.45 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.45 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.45 |
| ▸ | BID | P55957 | 3/20 | 0.42 |
| ▸ | MCL1 | Q07820 | 3/20 | 0.42 |
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.42 |
| ▸ | BAK1 | Q16611 | 2/20 | 0.42 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.42 |
| ▸ | PPARG | P37231 | 1/20 | 0.42 |
| ▸ | PPARA | Q07869 | 1/20 | 0.42 |
| ▸ | EP300 | Q09472 | 1/20 | 0.42 |
| ▸ | KAT2A | Q92830 | 1/20 | 0.42 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.42 |
| ▸ | KAT5 | Q92993 | 1/20 | 0.42 |
| ▸ | SAE1 | Q9UBE0 | 1/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3482049 | 0.94 | CYP3A4 (0.47) | LIPGNR1H2NR1H3ALOX5PTGS2 | |
| SCHEMBL1918471 | 0.86 | HTR1A (0.40) | LIPGCYP3A4PPARGPPARACYP2D6 | |
| SCHEMBL3482063 | 0.81 | LIPG (0.50) | LIPGNR1H2NR1H3ALOX5PTGS2 | |
| SCHEMBL82794 | 0.79 | LIPG (0.65) | LIPGNR1H2NR1H3ALOX5PTGS2 | |
| SCHEMBL30037094 | 0.79 | LIPG (0.65) | LIPGNR1H2NR1H3ALOX5PTGS2 | |
| SCHEMBL3482554 | 0.78 | CYP3A4 (0.41) | LIPGALOX5PTGS2BIDMCL1 | |
| SCHEMBL2524117 | 0.78 | CYP3A4 (0.41) | LIPGALOX5PTGS2BIDMCL1 | |
| SCHEMBL6114437 | 0.77 | GABRA1 (0.46) | MEN1TP53MAPTKMT2A | |
| SCHEMBL18496530 | 0.77 | LIPG (0.69) | LIPGNR1H2NR1H3ALOX5PTGS2 | |
| SCHEMBL6679764 | 0.77 | LIPG (0.69) | LIPGNR1H2NR1H3ALOX5PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12386257-B2 | Photosensitive resin composition, method of manufacturing pattern cured film, cured film, interlayer insulating film, cover coat layer, surface protective film, and electronic component | HD MICROSYSTEMS, LTD. (JP) | 2025-08-12 | — | — | US | disclosed |
| US-20240240061-A1 | RESIN COMPOSITION FOR DICING PROTECTION LAYER AND TREATMENT METHOD FOR SEMICONDUCTOR WAFER | RESONAC CORPORATION (JP) | 2024-07-18 | — | — | US | disclosed |
| US-20220276555-A1 | Photosensitive Resin Composition, Method Of Manufacturing Pattern Cured Film, Cured Film, Interlayer Insulating Film, Cover Coat Layer, Surface Protective Film, And Electronic Component | HD MICROSYSTEMS, LTD. (JP) | 2022-09-01 | — | — | US | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |