SCHEMBL3481818

SCHEMBL3481818

CCCO[SiH](c1ccccc1)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.39
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
LTA4H P09960 2/20 0.36
ALDH1A1 P00352 2/20 0.36
HPGD P15428 1/20 0.36
TP53 P04637 1/20 0.33
GAA P10253 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CHRNB2 P17787 1/20 0.31
CHRNB4 P30926 1/20 0.31
CHRNA3 P32297 1/20 0.31
CHRNA7 P36544 1/20 0.31
CHRNA4 P43681 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31
KCNA3 P22001 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3482606 0.90 LMNA (0.36) LMNAMEN1KMT2ALTA4HALDH1A1
SCHEMBL27943304 0.87 LMNA (0.33) LMNAMEN1KMT2ALTA4HALDH1A1
SCHEMBL864473 0.87 LTA4H (0.47) LTA4HALDH1A1HPGDTP53CYP1A2
SCHEMBL29498929 0.85 LTA4H (0.47) LMNALTA4HALDH1A1TP53SMN1; SMN2
SCHEMBL7910681 0.84 LTA4H (0.46) LMNAMEN1KMT2ALTA4HALDH1A1
SCHEMBL313696 0.82 LMNA (0.44) LMNAMEN1KMT2ALTA4HALDH1A1
SCHEMBL675683 0.81 LTA4H (0.37) MEN1KMT2ALTA4HALDH1A1TP53
SCHEMBL705167 0.80 LMNA (0.38) LMNAMEN1KMT2ALTA4HALDH1A1
SCHEMBL31229726 0.80 CA2 (0.41) MEN1KMT2AALDH1A1HPGDGAA
SCHEMBL23701036 0.79 TDP1 (0.37) ALDH1A1SMN1; SMN2KCNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11807758-B2 Siloxane polymer and method of producing siloxane polymer JNC CORPORATION (JP) 2023-11-07 US disclosed
EP-4056604-B1 METHOD FOR PRODUCING COPOLYMER OF 1,3,7-OCTATRIENE AND STYRENE KURARAY CO (JP) 2023-08-02 EP disclosed
EP-3564280-B1 COPOLYMER OF 1, 3, 7-OCTATRIENE AND STYRENE AND HYDRIDE THEREOF KURARAY CO (JP) 2023-07-26 EP disclosed
CN-114369097-B Heteroaromatic AhR inhibitors 山东轩竹医药科技有限公司 2023-07-14 CN disclosed
EP-4163312-A1 COPOLYMER OF 1,3,7-OCTATRIENE AND ISOPRENE, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID COPOLYMER Kuraray Co., Ltd. (JP) 2023-04-12 EP disclosed
EP-4163311-A1 COPOLYMER OF 1,3,7-OCTATRIENE AND ISOPRENE, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID COPOLYMER Kuraray Co., Ltd. (JP) 2023-04-12 EP disclosed
EP-3564274-B1 1, 3, 7-OCTATRIENE POLYMER, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID POLYMER KURARAY CO (JP) 2022-12-28 EP disclosed
EP-4056604-A1 METHOD FOR PRODUCING COPOLYMER OF 1,3,7-OCTATRIENE AND STYRENE Kuraray Co., Ltd. (JP) 2022-09-14 EP disclosed
US-11332567-B2 Copolymer of 1, 3, 7-octatriene and butadiene, hydride thereof, and method for producing said copolymer KURARAY CO., LTD. (JP) 2022-05-17 US disclosed
US-11198744-B2 1,3, 7-octatriene polymer, hydride thereof, and method for producing said polymer KURARAY CO., LTD. (JP) 2021-12-14 US disclosed
US-6930393-B2 hydrolyzable silicon compound or at least one product resulting from at least partial hydrolysis condensation of the silicon compound SHIN-ETSU CHEMICAL CO. LTD. (JP) 2005-08-16 US disclosed
US-20040237384-A1 Fuel compositions exhibiting improved fuel stability OCTANE INTERNATIONAL, LTD. 2004-12-02 US disclosed
CN-1536023-A Porous membrane shaping composition, preparation method of porous membrane, porous membrane intercalation insulating film and semiconductor device ��Խ��ѧ��ҵ��ʽ���� 2004-10-13 CN disclosed
US-20040195660-A1 Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2004-10-07 US disclosed
US-6652608-B1 Fuel compositions exhibiting improved fuel stability OCTANE INTERNATIONAL, LTD. 2003-11-25 US disclosed
EP-1258035-A1 PROCESS FOR WAFER LEVEL TREATMENT TO REDUCE STICTION AND PASSIVATE MICROMACHINED SURFACES AND COMPOUNDS USED THEREFOR ANALOG DEVICES, INC. (US) 2002-11-20 EP disclosed
WO-2001057920-A1 PROCESS FOR WAFER LEVEL TREATMENT TO REDUCE STICTION AND PASSIVATE MICROMACHINED SURFACES AND COMPOUNDS USED THEREFOR ANALOG DEVICES, INC. (US) 2001-08-09 WO disclosed
EP-0478284-B1 Organic silicon compounds and cosmetic compositions SHINETSU CHEMICAL CO (JP) 1995-12-06 EP disclosed
US-5254542-A Having ultraviolet absorbing benzotriazole or benzophenone group SHIN-ETSU CHEMICAL CO., LTD. 1993-10-19 US disclosed
EP-0478284-A2 Organic silicon compounds and cosmetic compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1992-04-01 EP disclosed