⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1988893 | 0.93 | — | — | |
| SCHEMBL6514982 | 0.90 | — | — | |
| SCHEMBL3481855 | 0.88 | ALDH1A1 (0.32) | — | |
| SCHEMBL619037 | 0.85 | — | — | |
| SCHEMBL8778094 | 0.81 | — | — | |
| SCHEMBL3482477 | 0.80 | TSHR (0.35) | — | |
| SCHEMBL2292470 | 0.78 | TSHR (0.33) | — | |
| SCHEMBL28729 | 0.76 | — | — | |
| SCHEMBL3482195 | 0.73 | TSHR (0.35) | — | |
| SCHEMBL3482286 | 0.73 | TSHR (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9695095-B2 | Process for preparing a catalyst based on a group VIII metal and containing silicon, and a process of selective hydrogenation implementing said catalyst | IFP Energies Nouvelles (FR) | 2017-07-04 | — | — | US | disclosed |
| CN-104302399-B | Process for preparing a catalyst based on a metal of group VIII and comprising silicon, and selective hydrogenation process using said catalyst | IFP 新能源公司 | 2017-03-22 | — | — | CN | disclosed |
| US-20150141718-A1 | PROCESS FOR PREPARING A CATALYST BASED ON A GROUP VIII METAL AND CONTAINING SILICON, AND A PROCESS OF SELECTIVE HYDROGENATION IMPLEMENTING SAID CATALYST | IFP Energies Nouvelles (FR) | 2015-05-21 | — | — | US | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| CN-104302399-A | Process for preparing a catalyst based on a metal of group VIII and comprising silicon, and selective hydrogenation process using said catalyst | IFP Energies Nouvelles | 2015-01-21 | — | — | CN | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |