Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
| ▸ | LMNA | P02545 | 3/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | CES2 | O00748 | 1/20 | 0.30 |
| ▸ | CES1 | P23141 | 1/20 | 0.30 |
| ▸ | ANPEP | P15144 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3481855 | 0.94 | ALDH1A1 (0.32) | TSHRLMNAALDH1A1THRBSMN1; SMN2 | |
| SCHEMBL3481973 | 0.94 | TSHR (0.35) | TSHRLMNAALDH1A1THRBSMN1; SMN2 | |
| SCHEMBL28014427 | 0.91 | TSHR (0.33) | TSHRLMNAALDH1A1THRBSMN1; SMN2 | |
| SCHEMBL272672 | 0.87 | TSHR (0.40) | TSHRLMNAALDH1A1THRBSMN1; SMN2 | |
| SCHEMBL9745674 | 0.85 | TSHR (0.39) | TSHRLMNAALDH1A1THRBSMN1; SMN2 | |
| SCHEMBL8778115 | 0.84 | TSHR (0.38) | TSHRLMNAALDH1A1THRBSMN1; SMN2 | |
| SCHEMBL28586451 | 0.84 | TSHR (0.38) | TSHRLMNAALDH1A1THRBSMN1; SMN2 | |
| SCHEMBL28593181 | 0.84 | TSHR (0.38) | TSHRLMNAALDH1A1THRBSMN1; SMN2 | |
| SCHEMBL3482286 | 0.81 | TSHR (0.35) | TSHRLMNAALDH1A1THRBSMN1; SMN2 | |
| SCHEMBL3482195 | 0.81 | TSHR (0.35) | TSHRLMNAALDH1A1THRBSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9695095-B2 | Process for preparing a catalyst based on a group VIII metal and containing silicon, and a process of selective hydrogenation implementing said catalyst | IFP Energies Nouvelles (FR) | 2017-07-04 | — | — | US | disclosed |
| CN-104302399-B | Process for preparing a catalyst based on a metal of group VIII and comprising silicon, and selective hydrogenation process using said catalyst | IFP 新能源公司 | 2017-03-22 | — | — | CN | disclosed |
| US-20150141718-A1 | PROCESS FOR PREPARING A CATALYST BASED ON A GROUP VIII METAL AND CONTAINING SILICON, AND A PROCESS OF SELECTIVE HYDROGENATION IMPLEMENTING SAID CATALYST | IFP Energies Nouvelles (FR) | 2015-05-21 | — | — | US | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| CN-104302399-A | Process for preparing a catalyst based on a metal of group VIII and comprising silicon, and selective hydrogenation process using said catalyst | IFP Energies Nouvelles | 2015-01-21 | — | — | CN | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |