Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 2/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.34 |
| ▸ | NPC1 | O15118 | 3/20 | 0.34 |
| ▸ | RAB9A | P51151 | 3/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | TARBP2 | Q15633 | 1/20 | 0.33 |
| ▸ | ENPP3 | O14638 | 1/20 | 0.33 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.33 |
| ▸ | AGXT | P21549 | 2/20 | 0.32 |
| ▸ | ESR1 | P03372 | 1/20 | 0.31 |
| ▸ | AR | P10275 | 1/20 | 0.31 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 3/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 3/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.31 |
| ▸ | IDO1 | P14902 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL707974 | 0.91 | NQO1 (0.33) | ESR1ARESR2 | |
| SCHEMBL6856508 | 0.90 | TSHR (0.35) | SMN1; SMN2NPC1RAB9ATSHRMEN1 | |
| SCHEMBL6841147 | 0.90 | TSHR (0.35) | SMN1; SMN2NPC1RAB9ATSHRMEN1 | |
| SCHEMBL6852204 | 0.86 | ENPP3 (0.35) | SMN1; SMN2NPC1RAB9ATSHRTARBP2 | |
| SCHEMBL6843073 | 0.84 | CYP2C19 (0.39) | TDP1SMN1; SMN2NPC1RAB9ATSHR | |
| SCHEMBL6848590 | 0.84 | CYP2C19 (0.39) | TDP1SMN1; SMN2NPC1RAB9ATSHR | |
| SCHEMBL6852172 | 0.84 | CYP2C19 (0.39) | TDP1SMN1; SMN2NPC1RAB9ATSHR | |
| SCHEMBL6846645 | 0.84 | CYP2C19 (0.39) | TDP1SMN1; SMN2NPC1RAB9ATSHR | |
| SCHEMBL25168728 | 0.84 | ESR1 (0.33) | SMN1; SMN2NPC1RAB9AENPP3ENPP1 | |
| SCHEMBL3482147 | 0.83 | ACHE (0.33) | ACHETDP1AGXTESR1AR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230302533-A1 | Additive Manufacturing Powder And Additively Manufactured Body | SEIKO EPSON CORPORATION (JP) | 2023-09-28 | — | — | US | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| CN-101641767-B | Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device | FUJITSU LTD | 2013-10-30 | — | — | CN | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-20080118834-A1 | Core of an active material being capable of performing reversible electrochemical oxidation and reduction; a coating layer on the surface of the core with a reticular structure and a metal oxide with side chains of alkyl group, a haloalkyl group, a substituted or unsubstituted aryl group | SAMSUNG SDI CO., LTD. A CORPORATION CHARTERED IN AND EXISTING UNDER THE LAWS OF THE REPUBLIC OF KOREA (KR) | 2008-05-22 | — | — | US | disclosed |