SCHEMBL3482758

SCHEMBL3482758

C[Si](C)(C)N1C(=O)C=CC1=O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 13/20 0.45
GSK3A P49840 1/20 0.45
GSK3B P49841 1/20 0.45
ALDH1A1 P00352 2/20 0.39
LMNA P02545 2/20 0.39
MAPT P10636 2/20 0.39
NPSR1 Q6W5P4 2/20 0.39
GMNN O75496 1/20 0.39
THPO P40225 1/20 0.39
BLM P54132 1/20 0.39
PMP22 Q01453 1/20 0.39
FAAH O00519 5/20 0.35
HSP90AA1 P07900 2/20 0.33
CCR6 P51684 1/20 0.33
BCHE P06276 1/20 0.33
GAA P10253 1/20 0.32
TLR9 Q9NR96 2/20 0.32
TP53 P04637 1/20 0.32
PKM P14618 1/20 0.32
HPGD P15428 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31187422 0.73 MGLL (0.44) MGLLGSK3AGSK3BALDH1A1LMNA
SCHEMBL3482689 0.73 MGLL (0.38) MGLLGSK3AGSK3BALDH1A1LMNA
SCHEMBL9576348 0.71 MGLL (0.36) MGLLGSK3AGSK3BALDH1A1LMNA
SCHEMBL31187420 0.69 MGLL (0.46) MGLLGSK3AGSK3BALDH1A1LMNA
SCHEMBL3679923 0.64 MGLL (0.41) MGLLGSK3AGSK3BALDH1A1LMNA
SCHEMBL10795168 0.63 MGLL (0.39) MGLLGSK3AGSK3BALDH1A1LMNA
SCHEMBL8734103 0.63 MGLL (0.52) MGLLGSK3AGSK3BALDH1A1LMNA
SCHEMBL9804371 0.62 BRD4 (0.32) RECQL
SCHEMBL36966 0.62
SCHEMBL8744524 0.61 CASP3 (0.46) ALDH1A1MAPTRECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-9194524-A None JP disclosed
JP-4332705-A None JP disclosed
CN-119065201-A Radiation-sensitive composition, cured film, method for producing same, semiconductor element, and display element JSR株式会社 2024-12-03 CN disclosed
US-20200144074-A1 PROCESS FOR THE ETCHING METAL- OR SEMIMETAL-CONTAINING MATERIALS BASF SE (DE) 2020-05-07 US disclosed
US-8420764-B2 Compound having silsesquioxane skeleton and its polymer JNC CORPORATION (JP) 2013-04-16 US disclosed
US-8236917-B2 Compound having silsesquioxane skeleton and its polymer JNC CORPORATION (JP) 2012-08-07 US disclosed
US-20120178894-A1 COMPOUND HAVING SILSESQUIOXANE SKELETON AND ITS POLYMER INAGAKI JYUN-ICHI (JP) 2012-07-12 US disclosed
US-20100240855-A1 Compound having silsesquioxane skeleton and its polymer JNC CORPORATION (JP) 2010-09-23 US disclosed
US-7705105-B2 A cyclic polymer of silsesquioxane skeleton with side chains formed byhydrosilation of an unsaturated end group containing an active polymerfunctional group; polyimidesiloxane copolymers; polyestersiloxane copolymers; high molecular weight; thin films; strength; heat resistance;waterproofing; CHISSO PETROCHEMICAL CORPORATION (JP) 2010-04-27 US disclosed
US-20070190344-A1 Verification of translation JNC CORPORATION (JP) 2007-08-16 US disclosed
US-5457104-A Antibacterials BAYER AKTIENGESELLSCHAFT (DE) 1995-10-10 US disclosed
CN-1097423-A Quinolone-and naphthyridonecarboxylic acid derivatives BAYER AG (DE) 1995-01-18 CN disclosed
EP-0607825-A1 6-H-4-OXO-3-quinoline-carboxylic acids and their analogues as antibacterial agents BAYER AG (DE) 1994-07-27 EP disclosed
US-5194627-A N-TERT-BUTYLDIALKYLSILYLMALEIMIDE AND ITS MANUFACTURE SHIN-ETSU CHEMICAL CO., LTD. (JP) 1993-03-16 US disclosed
EP-0523512-A1 8-vinyl- and 8-ethinyl-quinolone carboxylic acids BAYER AG (DE) 1993-01-20 EP disclosed
EP-0520240-A1 7-Isoindolinyl-quinolone and naphthyridonecarboxylic acid derivatives BAYER AG (DE) 1992-12-30 EP disclosed
EP-0514148-A1 Manufacture of N-tert-butyldialkylsilylmaleimide SHIN-ETSU CHEMICAL CO., LTD. (JP) 1992-11-19 EP disclosed
JP-H04332705-A NOVEL MALEIMIDE DERIVATIVE AND POLYMER COMPRISING REPEATING UNIT THEREOF TOSOH CORP 1992-11-19 JP disclosed
US-5104428-A N-substituted maleimide polymers; gas permeability, heat resistance, durability TOSOH CORPORATION (JP) 1992-04-14 US disclosed
EP-0466011-A1 Separation membrane Tosoh Corporation (JP) 1992-01-15 EP disclosed